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公开(公告)号：US20240353315A1
公开(公告)日：2024-10-24
申请号：US18759703
申请日：2024-06-28
Applicant: ASML NETHERLANDS B.V.
Inventor： Andrey Nikipelov , Saeedeh Farokhipoor , Maarten Van Kampen
CPC classification number: G01N21/15 , G01N21/8806 , G01N21/9501 , G02B1/18 , G02B5/0891
Abstract: A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., one or more mirrors of a VUV) of a substrate inspection system is disclosed. The cleaning system ionizes or disassociates hydrogen gas in a VUV optics environment to generate hydrogen radicals (e.g., H*) or ions (e.g., H+, H2+, H3+), which remove water or hydrocarbons from the surface of the one or more mirrors. The one or more VUV mirrors may include a reflective material, such as aluminum. The one or more VUV mirrors may have a protective coating to protect the reflective material from any detrimental reaction to the hydrogen radicals or ions. The protective coating may include a noble metal.
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公开(公告)号：US20240210307A1
公开(公告)日：2024-06-27
申请号：US18543626
申请日：2023-12-18
Applicant: Endress+Hauser Conducta GmbH+Co. KG
Inventor： Stefan Paul , Tobias Mieth
CPC classification number: G01N21/15 , G01N21/05 , G01N2021/0125
Abstract: A measuring arrangement for determining a physical process variable, a state variable or a property of the measuring medium, in particular a concentration of one or more components contained in the measuring medium, wherein the measuring arrangement comprises at least one measuring cell having a measuring path and a measuring sensor, wherein the measuring cell comprises a gamma-sterilizable data memory having at least one data set that is specific to a memory cell, and a method for using the measuring arrangement.
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公开(公告)号：US11946858B2
公开(公告)日：2024-04-02
申请号：US17285557
申请日：2019-10-07
Applicant: HITACHI HIGH-TECH CORPORATION
Inventor： Yoshihiro Satou , Toshio Masuda , Hitoshi Matsuno , Kei Shibayama , Osamu Yoshimura , Yuichirou Iijima
CPC classification number: G01N21/15 , G01N21/9501 , G01N2021/151
Abstract: The purpose of the present invention is to allow a clean airflow around a substrate to reliably move downward of the substrate in an examination device in which clean air is supplied to an inspection chamber. This examination device is provided with a rectifying plate (see FIG. 4A) which covers a part of the upper surface of a stage for mounting a substrate, and is disposed between a gas supply unit and the stage to block an airflow toward the substrate.
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公开(公告)号：US11849202B2
公开(公告)日：2023-12-19
申请号：US18051179
申请日：2022-10-31
Applicant: VIAVI Solutions Inc.
Inventor： Kevin Cassady
CPC classification number: H04N23/54 , G01N21/15 , G02B6/3898 , H04N23/55 , G01N2021/157
Abstract: An optical system may include an objective lens system having a primary optical axis and a relay lens system having a relay optical axis. The relay optical axis may have a first angular offset with respect to the primary optical axis. The objective lens system may be configured to provide light from a light source to the relay lens system and provide light from the relay lens system to an image sensor. The relay lens system may be configured to provide light from the objective lens system to an end face of an optical fiber, where the end face has a second angular offset with respect to a cross-sectional axis of the optical fiber. The relay lens system may provide light reflected from the end face to the objective lens system.
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公开(公告)号：US20230221241A1
公开(公告)日：2023-07-13
申请号：US17997644
申请日：2021-06-10
Applicant: CYTIVA SWEDEN AB
Inventor： Hanno Ehring , Klaus Gebauer
CPC classification number: G01N21/05 , G01N21/15 , G01N2021/052 , G01N2201/0245
Abstract: Disclosed is an optical flow cell (100, 300) and a method (400) for bioprocessing applications. The optical flow cell (100, 300) comprises a fluid inlet (102, 302), a fluid outlet (104, 304), and a fluid flow channel (106, 306) provided between said fluid inlet (102, 302) and said fluid outlet (104, 304). The optical flow cell (100, 300) also comprises an output optical waveguide (108, 308) configured to emit light into said fluid flow channel (106, 306), and a collector optical waveguide (110, 310) configured to collect light from said fluid flow channel (106, 306). An optical pathlength adjuster (120, 320) for varying the optical pathlength (130, 330) between said output optical waveguide (108, 308) and said collector optical waveguide (110, 310) is also provided.
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Patent Agency Ranking
公开(公告)号：US20190195807A1
公开(公告)日：2019-06-27
申请号：US16325647
申请日：2017-08-17
Applicant: TECAN TRADING AG
Inventor： Manfred LANSING , Johannes POSCH , Tobias SAWETZKI
CPC classification number: G01N21/76 , G01N21/15 , G01N21/253
Abstract: A measuring device for the measurement of light signals emitted from samples in wells of a microplate, in particular to a luminescence measuring device for measuring luminescence signals. The luminescence measuring device has a first injector with an injector needle having an outlet end for dispensing a reagent into a well, and a luminescence optical device having an optical axis extending substantially perpendicularly to the microplate and a measuring region surrounding the optical axis. The injector needle extends to below the luminescence optical device and opens with its outlet end into the measuring region. The luminescence measuring device has further a spray deflector arranged between the outlet end of the injector and the luminescence optical device.
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公开(公告)号：US20190195768A1
公开(公告)日：2019-06-27
申请号：US16322370
申请日：2017-07-28
Applicant: PCME Limited
Inventor： David Christopher Unitt , Trevor Allan Lye , Bruce Greetham
IPC: G01N15/10 , G01F1/74 , G08B17/107
CPC classification number: G01N15/10 , G01F1/74 , G01N15/0205 , G01N21/15 , G01N21/53 , G01N2015/0096 , G01N2015/1075 , G01N2021/536 , G01N2201/024 , G01N2201/12707 , G08B17/107
Abstract: A method and apparatus (1) for monitoring particles flowing in a stack are disclosed. The method comprises emitting light from a light source along an optical path for scattering from the particles, rotating a rotatable monitoring assembly (15) mounted in the optical path, and detecting the scattered light using a detector. The rotatable monitoring assembly (15) contains at least two in apertures, and the method further comprises rotating the rotatable monitoring assembly (15) into a plurality of different configurations. In an operation configuration, light passes through the rotatable monitoring assembly (15) and into the stack unimpeded. In a zero-check configuration, the rotatable monitoring assembly (15) blocks the light from reaching the stack. In a span-check configuration, light of varying intensity passes from the light source through the rotatable monitoring assembly (15) into the stack. In a contamination-check configuration, the light is reflected through the rotatable monitoring assembly (15) onto the detector, without entering the stack. In the safety-shutter configuration, the rotatable monitoring assembly (15) protects optical components in the instrument from particles in the stack.
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公开(公告)号：US20190094148A1
公开(公告)日：2019-03-28
申请号：US16087461
申请日：2017-03-06
Applicant: Yanmar Co., Ltd. , Fuji Electric Co., Ltd.
Inventor： Yoshinori FUKUI , Ryota KOBAYASHI , Tesuya YOKOYAMA , Tsuyoshi INOUE , Yusuke ODA , Michiyasu OKADA , Kozo AKAO , Ryouichi HIGASHI
IPC: G01N21/85 , G01N21/15 , G01N21/3504
CPC classification number: G01N21/85 , G01N21/03 , G01N21/15 , G01N21/3504 , G01N2021/151 , G01N2021/8578
Abstract: A gas concentration measuring device (1) including a light emitter (3) and a light receiver (4) which are disposed so as to be opposed to each other with a hollow tube-like measurement pipe (2) interposed therebetween. The device (1) is configured to measure concentration of target gas passing through the measurement pipe (2) using light applied from the light emitter (3) transmitted through the inside of the measurement pipe (2), and received by the light receiver (4). Purge gas guide pipes (11, 13) through which purge gas is introduced into optical systems of the light emitter (3) and the light receiver (4) are connected to a side wall of the measurement pipe (2). The measurement pipe (2) includes a gas entrance portion (21) having a tapered shape widening from a gas supply port toward a downstream side thereof.
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公开(公告)号：US10082461B2
公开(公告)日：2018-09-25
申请号：US14809054
申请日：2015-07-24
Applicant: Nanometrics Incorporated
Inventor： Andrew S. Klassen , Andrew J. Hazelton , Andrew H. Barada , Todd M. Petit , Chuan Sheng Tu
CPC classification number: G01N21/4785 , G01N21/01 , G01N21/15 , G01N2021/151 , G01N2201/02 , G01N2201/068 , G03F7/70933
Abstract: An integrated metrology module includes a chuck for holding a sample and positioning the sample with respect to an optical metrology device, a reference chip for the optical metrology device, the reference chip being movable to various positions with respect to the optical metrology device, and a reference chip purge device provides a flow of purge gas or air over the reference chip while the reference chip is in the various positions. The reference chip purge device may be static or movable with the reference chip.
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公开(公告)号：US10078070B2
公开(公告)日：2018-09-18
申请号：US13986000
申请日：2012-02-17
Applicant: Yoshiaki Hashimoto , Noriyoshi Okada
Inventor： Yoshiaki Hashimoto , Noriyoshi Okada
CPC classification number: G01N30/00 , G01N21/15 , G01N21/253 , G01N21/31 , G01N21/9018 , G01N35/025 , G01N2021/157 , G01N2035/009 , G01N2201/0415
Abstract: An analyzer, and a method and an apparatus for detecting liquid overflowing from a container that the analyzer comprises, are provided. The method according to the present invention for detecting liquid overflowing from a container in the analyzer, includes a step of judging that liquid is overflowing from at least one container if the difference between a standard deviation of absorbance of the liquid measured at a plurality of points of a container at time T1 and a standard deviation of absorbance of the liquid measured at a plurality of points in said container at time T2 is greater than a predetermined threshold value.
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