公开(公告)号：US10896282B2

公开(公告)日：2021-01-19

申请号：US16316465

申请日：2017-06-23

Applicant: ASML NETHERLANDS B.V.

Inventor： Taksh Pandey ,  Mark Christopher Simmons

IPC: G06F17/50 ,  G06F30/398 ,  G03F1/36 ,  G03F7/20

Abstract: A process, including: obtaining data specifying a layout of a lithographic pattern; obtaining performance metrics of a computational analysis of the layout, the performance metrics indicating performance of one or more computer processes performing respective portions of the computational analysis; correlating the performance metrics to portions of the layout processed during measurement of the respective performance metrics; and generating a three or higher dimensional visualization based on a result of correlating the performance metrics to portions of the layout processed during measurement, wherein at least some of the visualization dimensions indicate relative positions of portions of the layout and at least some of the visualization dimensions indicate a performance metric correlated to the respective portions.