公开(公告)号：US20210041788A1

公开(公告)日：2021-02-11

申请号：US16965130

申请日：2019-02-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Anton Bernhard VAN OOSTEN ,  Vidya VAENKATESAN ,  James Norman WILEY ,  Reinder Teun PLUG

IPC: G03F7/20

Abstract: A method for inspection of a patterning device. The method includes obtaining (i) patterning device apparatus data of a patterning device making process, (ii) a patterning device substrate map based on the patterning device apparatus data, and (iii) predicted process window limiting pattern locations corresponding to the patterning device based on the patterning device substrate map, and based on the process window limiting pattern locations, guiding a patterning device inspection apparatus to the process window limiting pattern locations for defect inspection.