专利检索 ap:("ASML NETHERLANDS B.V." OR "ASML HOLDING N.V.") AND inv:"Diane Elaine MARIKOYA" 第 1 页

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发明申请
LITHOGRAPHIC APPARATUS, A DRYER AND A METHOD OF REMOVING LIQUID FROM A SURFACE 审中-公开

公开(公告)号：US20190121247A1

公开(公告)日：2019-04-25

申请号：US16226731

申请日：2018-12-20

申请人： ASML NETHERLANDS B.V. , ASML HOLDING N.V.

发明人： Martinus Hendrikus Antonius LEENDERS , Sjoerd Nicolaas Lambertus DONDERS , Harry SEWELL , Louis John MARKOYA , Marcus Martinus Petrus Adrianus VERMEULEN , Diane Elaine MARIKOYA

IPC分类号： G03F7/20

摘要： A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.