中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

5 records (took 0.022 seconds)

    TUNABLE WAVELENGTH ILLUMINATION SYSTEM
    3.
    发明申请
    TUNABLE WAVELENGTH ILLUMINATION SYSTEM 审中-公开
    可调波长照明系统

    公开(公告)号：US20140253891A1

    公开(公告)日：2014-09-11

    申请号：US14281346

    申请日：2014-05-19

    Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

    Inventor： Arie Jeffrey DEN BOEF ,  Earl William EBERT, JR. ,  Harry SEWELL ,  Keith William ANDRESEN ,  Sanjeev Kumar SINGH

    IPC: G03F7/20 ,  G02F1/11

    CPC classification number: G03F7/70141 ,  G01B11/14 ,  G02F1/116 ,  G03F7/70191 ,  G03F9/7065

    Abstract: A lithographic apparatus comprises an alignment system including a tunable narrow pass-band filter configured to receive a broad-band radiation and to filter the broad-band radiation into narrow-band linearly polarized radiation. The tunable narrow pass-band filter is further configured to modulate an intensity and wavelength of the narrow-band radiation and to provide a plurality of pass-band filters at a same time or nearly the same time. The alignment system further includes a relay and mechanical interface configured to receive the narrow-band radiation and to adjust a profile of the narrow-band radiation based on physical properties of alignment targets on a substrate. The adjusted narrow-band radiation is focused on the alignment targets using a focusing system.

    Abstract translation: 光刻设备包括对准系统，其包括被配置为接收宽带辐射并将宽带辐射过滤成窄带线偏振辐射的可调谐窄带通滤波器。 可调谐窄带通滤波器还被配置为调制窄带辐射的强度和波长并且在同时或几乎同时提供多个通带滤波器。 对准系统还包括被配置为接收窄带辐射并基于衬底上的对准靶的物理特性来调整窄带辐射的轮廓的继电器和机械接口。 使用聚焦系统将经调整的窄带辐射聚焦在对准目标上。

    Alignment Target Contrast in a Lithographic Double Patterning Process
    4.
    发明申请
    Alignment Target Contrast in a Lithographic Double Patterning Process 有权
    光刻双重图案化过程中的对准目标对比度

    公开(公告)号：US20140192333A1

    公开(公告)日：2014-07-10

    申请号：US14202835

    申请日：2014-03-10

    Applicant: ASML Holding N.V

    Inventor： Harry SEWELL ,  Mircea Dusa ,  Richard Johannes Franciscus Van Haren ,  Manfred Gawein Tenner ,  Maya Angelova Doytcheva

    IPC: G03F9/00

    CPC classification number: G03F9/7046 ,  G03F7/0035 ,  G03F7/105 ,  G03F7/70466 ,  G03F9/7076 ,  H01L21/0273 ,  H01L21/32139

    Abstract: A system and method of manufacturing a semiconductor device lithographically and an article of manufacture involving a lithographic double patterning process having a dye added to either the first or second lithographic pattern are provided. The dye is used to detect the location of the first lithographic pattern and to directly align the second lithographic pattern to it. The dye may be fluorescent, luminescent, absorbent, or reflective at a specified wavelength or a given wavelength band. The wavelength may correspond to the wavelength of an alignment beam. The dye allows for detection of the first lithographic pattern even when it is over coated with a radiation sensitive-layer (e.g., resist).

    Abstract translation: 提供光刻制造半导体器件的系统和方法以及涉及具有添加到第一或第二光刻图案上的染料的光刻双重图案化工艺的制品。 该染料用于检测第一光刻图案的位置，并将第二光刻图案直接对准。 染料可以是在指定波长或给定波长带处的荧光，发光，吸收或反射。 波长可对应于对准光束的波长。 染料允许检测第一光刻图案，即使当其涂覆有辐射敏感层（例如抗蚀剂）时。

    Tunable Wavelength Illumination System
    5.
    发明申请
    Tunable Wavelength Illumination System 有权
    可调波长照明系统

    公开(公告)号：US20130258316A1

    公开(公告)日：2013-10-03

    申请号：US13898973

    申请日：2013-05-21

    Applicant: ASML Holding N.V.

    Inventor： Arie Jeffrey DEN BOEF ,  Earl William EBERT ,  Harry SEWELL ,  Keith William ANDRESEN ,  Sanjeev Kumar SINGH

    IPC: G01B11/14 ,  G03F7/20

    CPC classification number: G03F7/70141 ,  G01B11/14 ,  G02F1/116 ,  G03F7/70191 ,  G03F9/7065

    Abstract: A lithographic apparatus has an alignment system including a radiation source configured to convert narrow-band radiation into continuous, flat and broad-band radiation. An acoustically tunable narrow pass-band filter filters the broad-band radiation into narrow-band linearly polarized radiation. The narrow-band radiation may be focused on alignment targets of a wafer so as to enable alignment of the wafer. In an embodiment, the filter is configured to modulate an intensity and wavelength of radiation produced by the radiation source and to have multiple simultaneous pass-bands. The radiation source generates radiation that has high spatial coherence and low temporal coherence.

    Abstract translation: 光刻设备具有对准系统，其包括被配置为将窄带辐射转换成连续，平坦和宽带辐射的辐射源。 声可调窄带通滤波器将宽带辐射滤波成窄带线偏振辐射。 窄带辐射可以聚焦在晶片的对准目标上，以便能够对准晶片。 在一个实施例中，滤波器被配置为调制由辐射源产生的辐射的强度和波长并且具有多个同时的通带。 辐射源产生具有高空间相干性和低时间相干性的辐射。

Patent Agency Ranking