公开(公告)号：US11237490B2

公开(公告)日：2022-02-01

申请号：US16084596

申请日：2017-01-26

申请人： ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

发明人： Bearrach Moest ,  Lowell Lane Baker ,  James Robert Downes ,  Wijnand Hoitinga ,  Hermen Folken Pen

IPC分类号： G03F7/20

摘要： An apparatus including an illumination system to condition a radiation beam, a support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system to project the patterned radiation beam onto a target portion of the substrate, and a control system configured to: receive pattern data characterizing a pattern distribution, receive radiation data characterizing the radiation beam, determine a dissipation distribution of the pattern based on the pattern data and the radiation data, determine deformation of the pattern by applying the dissipation distribution in a thermo-mechanical model of the patterning device, and determine a control signal to control a component of the apparatus based on the deformation of the pattern.