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公开(公告)号：US09857694B2
公开(公告)日：2018-01-02
申请号：US15122772
申请日：2015-03-05
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Bearrach Moest , Peter A. Delmastro , Johannes Onvlee , Adrianus Martinus Van Der Wielen , Christopher Charles Ward
CPC classification number: G03F7/70616 , G01B11/14 , G03F7/70058 , G03F7/70775 , G03F7/70783 , G03F7/70875
Abstract: A system and method are provided for determining deformation of a patterning device and/or shift position of the patterning device relative. The system includes a first sensing sub-system that measures respective positions of a plurality of reference marks on the patterning device, and a second sensing sub-system that measures positions of the edge of the patterning device relative to the support. The system further includes a controller to determine an absolute position of the patterned portion and change in the absolute position based on measured respective positions of marks on the patterning device, determine a change in a relative position of the edge of the patterned device based on the measured edge positions, and estimate a change in a position of the patterning device relative to the support and a change in a pattern distortion of the patterned portion of the patterning device over a time period.
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公开(公告)号：US11237490B2
公开(公告)日：2022-02-01
申请号：US16084596
申请日：2017-01-26
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Bearrach Moest , Lowell Lane Baker , James Robert Downes , Wijnand Hoitinga , Hermen Folken Pen
IPC: G03F7/20
Abstract: An apparatus including an illumination system to condition a radiation beam, a support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system to project the patterned radiation beam onto a target portion of the substrate, and a control system configured to: receive pattern data characterizing a pattern distribution, receive radiation data characterizing the radiation beam, determine a dissipation distribution of the pattern based on the pattern data and the radiation data, determine deformation of the pattern by applying the dissipation distribution in a thermo-mechanical model of the patterning device, and determine a control signal to control a component of the apparatus based on the deformation of the pattern.
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公开(公告)号：US10705438B2
公开(公告)日：2020-07-07
申请号：US16716568
申请日：2019-12-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus Jeunink , Laurentius Johannes Adrianus Van Bokhoven , Stan Henricus Van Der Meulen , Yang-Shan Huang , Federico La Torre , Bearrach Moest , Stefan Carolus Jacobus Antonius Keij , Enno Van Den Brink , Christine Henriette Schouten , Hoite Pieter Theodoor Tolsma
Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
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公开(公告)号：US11599027B2
公开(公告)日：2023-03-07
申请号：US17520803
申请日：2021-11-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Wim Tjibbo Tel , Hans Erik Kattouw , Valerio Altini , Bearrach Moest
Abstract: A lithographic apparatus and associated method of controlling a lithographic process. The lithographic apparatus has a controller configured to define a control grid associated with positioning of a substrate within the lithographic apparatus. The control grid is based on a device layout, associated with a patterning device, defining a device pattern which is to be, and/or has been, applied to the substrate in a lithographic process.
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Patent Agency Ranking
公开(公告)号：US20200117097A1
公开(公告)日：2020-04-16
申请号：US16716568
申请日：2019-12-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus JEUNINK , Laurentius Johannes Adrianus Van Bokhoven , Stan Henricus Van Der Meulen , Yang-Shan Huang , Federico La Torre , Bearrach Moest , Stefan Carolus Jacobus Antonius Keij , Enno Van Den Brink , Christine Henriette Schouten , Hoite Pieter Theodoor Tolsma
Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
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公开(公告)号：US10571814B2
公开(公告)日：2020-02-25
申请号：US16318191
申请日：2017-06-29
Applicant: ASML NETHERLANDS B.V.
Inventor： Andre Bernardus Jeunink , Laurentius Johannes Adrianus Van Bokhoven , Stan Henricus Van Der Meulen , Yang-Shan Huang , Federico La Torre , Bearrach Moest , Stefan Carolus Jacobus Antonius Keij , Enno Van Den Brink , Christine Henriette Schouten , Hoite Pieter Theodoor Tolsma
Abstract: A lithographic apparatus has a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
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公开(公告)号：US11644755B2
公开(公告)日：2023-05-09
申请号：US17279648
申请日：2019-09-11
Applicant: ASML NETHERLANDS B.V.
Inventor： Bearrach Moest , Rowin Meijerink , Thijs Schenkelaars , Norbertus Josephus Martinus Van Den Nieuwelaar , Laurentius Johannes Adrianus Van Bokhoven
IPC: G03F7/20
CPC classification number: G03F7/705 , G03F7/706 , G03F7/70358 , G03F7/70983
Abstract: A method of predicting deflection of a pellicle which will occur during movement of the pellicle in a lithographic apparatus, the method including receiving parameters regarding properties of the pellicle and receiving parameters regarding the expected movement of the pellicle. The parameters are applied to a model which predicts deflection of the pellicle as a function of those parameters. The model includes a plurality of sub-models which relate to different components of deflection of the pellicle. An output of the model may be used to predict.
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8.发明授权公开(公告)号：US09658541B2
公开(公告)日：2017-05-23
申请号：US14322625
申请日：2014-07-02
Applicant: ASML NETHERLANDS B.V.
Inventor： Marcus Adrianus Van De Kerkhof , Willem Jurrianus Venema , Bearrach Moest , Vasco Miguel Matias Serrao , Cedran Bomhof
CPC classification number: G03F7/70775 , B21B38/00 , G03F9/7011 , G03F9/7019 , G03F9/7026 , G03F9/7088 , G03F9/7092 , H01J2235/062
Abstract: A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems.
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公开(公告)号：US11199782B2
公开(公告)日：2021-12-14
申请号：US16468304
申请日：2017-11-22
Applicant: ASML NETHERLANDS B.V.
Inventor： Wim Tjibbo Tel , Hans Erik Kattouw , Valerio Altini , Bearrach Moest
Abstract: A lithographic apparatus and associated method of controlling a lithographic process. The lithographic apparatus has a controller configured to define a control grid associated with positioning of a substrate within the lithographic apparatus. The control grid is based on a device layout, associated with a patterning device, defining a device pattern which is to be, and/or has been, applied to the substrate in a lithographic process.
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