公开(公告)号：US20220252990A1

公开(公告)日：2022-08-11

申请号：US17625640

申请日：2020-07-07

Applicant: ASML Netherlands B,V.

Inventor： Narjes JAVAHERI ,  Maurits VAN DER SCHAAR ,  Tieh-Ming CHANG ,  Hilko Dirk BOS ,  Patrick WARNNAR ,  Samira BAHRAMI ,  Mohammadreza HAJIAHMADI ,  Sergey TARABRIN ,  Mykhailo SEMKIV

IPC: G03F7/20

Abstract: Disclosed is a method comprising measuring radiation reflected from a metrology target and decomposing the measured radiation in components, for example Fourier components or spatial components. Further, there is disclosed a recipe selection method which provides an algorithm to select a parameter of the metrology apparatus based on re-calculated dependencies of 5 the measured radiation based on single components.