公开(公告)号：US20240412067A1

公开(公告)日：2024-12-12

申请号：US18808844

申请日：2024-08-19

Applicant: ASML Netherlands B. V.

Inventor： Lorenzo TRIPODI ,  Patrick WARNAAR ,  Grzegorz GRZELA ,  Mohammadreza HAJIAHMADI ,  Farzad FARHADZADEH ,  Patricius Aloysius Jacobus TINNEMANS ,  Scott Anderson MIDDLEBROOKS ,  Adrianus Cornelis Matheus KOOPMAN ,  Frank STAALS ,  Brennan PETERSON ,  Anton Bernhard VAN OOSTEN

IPC: G06N3/08 ,  G01B11/02 ,  G01N21/55 ,  G06T7/00

Abstract: Disclosed is a method of determining a characteristic of interest relating to a structure on a substrate formed by a lithographic process, the method comprising: obtaining an input image of the structure; and using a trained neural network to determine the characteristic of interest from said input image. Also disclosed is a reticle comprising a target forming feature comprising more than two sub-features each having different sensitivities to a characteristic of interest when imaged onto a substrate to form a corresponding target structure on said substrate. Related methods and apparatuses are also described.

公开(公告)号：US20220252990A1

公开(公告)日：2022-08-11

申请号：US17625640

申请日：2020-07-07

Applicant: ASML Netherlands B,V.

Inventor： Narjes JAVAHERI ,  Maurits VAN DER SCHAAR ,  Tieh-Ming CHANG ,  Hilko Dirk BOS ,  Patrick WARNNAR ,  Samira BAHRAMI ,  Mohammadreza HAJIAHMADI ,  Sergey TARABRIN ,  Mykhailo SEMKIV

IPC: G03F7/20

Abstract: Disclosed is a method comprising measuring radiation reflected from a metrology target and decomposing the measured radiation in components, for example Fourier components or spatial components. Further, there is disclosed a recipe selection method which provides an algorithm to select a parameter of the metrology apparatus based on re-calculated dependencies of 5 the measured radiation based on single components.