公开(公告)号：US20230288818A1

公开(公告)日：2023-09-14

申请号：US18017178

申请日：2021-06-14

Applicant: ASML Netherlands B,V.

Inventor： Wenjie JIN ,  Petrus Wilhelmus SMORENBURG ,  Nan LIN ,  Christina Lynn PORTER ,  David O'DWYER ,  Cord Louis ARNOLD ,  Sjoerd Nicolaas,Lambertus DONDERS

IPC: G03F7/20

CPC classification number: G03F7/70641 ,  G03F7/70008

Abstract: Disclosed is an illumination source comprising a gas delivery system being configured to provide a gas target for generating an emitted radiation at an interaction region of the gas target, and an interferometer for illuminating at least part of the gas target with an interferometer radiation to measure a property of the gas target.