公开(公告)号：US20040130694A1

公开(公告)日：2004-07-08

申请号：US10686813

申请日：2003-10-17

Applicant: ASML Netherlands B. V.

Inventor： Ralph Kurt ,  Levinus Pieter Bakker ,  Frank Jeroen Pieter Schuurmans

IPC: G03B027/72 ,  G03B027/42

CPC classification number: G03F7/70983 ,  G03F7/702 ,  G03F7/70233

Abstract: A lithographic projection apparatus is provided wherein an object situated in a pulsed beam of radiation has an electrode in its vicinity and a voltage source connected either to the electrode or to the object. This configuration can provide a negative voltage pulse to the object relative to the electrode. The beam of radiation and the voltage pulse from the voltage source are provided in phase or out of phase. In this way, the object is shielded against secondary electrons generated by radiation beam illumination.

Abstract translation: 提供了一种光刻投影装置，其中位于脉冲辐射束中的物体在其附近具有电极，并且电压源连接到电极或物体。 该配置可以相对于电极向对象提供负电压脉冲。 辐射束和来自电压源的电压脉冲以相位或相位提供。 以这种方式，物体被遮蔽以防止由辐射束照射产生的二次电子。