公开(公告)号：US20200233319A1

公开(公告)日：2020-07-23

申请号：US16625135

申请日：2018-06-07

Applicant: ASML Netherlands B.V.

Inventor： Adrianus, Hendrik Koevoets ,  Cornelis, Adrianus De Meijere ,  Willem, Michiel De Rapper ,  Sjoerd, Nicolaas, Lambertus Donders ,  Jan Groenewold ,  Alain, Louis, Claude Leroux ,  Maxim, Aleksandrovich Nasalevich ,  Andrey Nikipelov ,  Johannes, Adrianus, Cornelis, Maria Pijnenburg ,  Jacobus, Cornelis, Gerardus Van Der Sanden

IPC: G03F7/20

Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.