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公开(公告)号：US11287752B2
公开(公告)日：2022-03-29
申请号：US16625135
申请日：2018-06-07
发明人： Adrianus Hendrik Koevoets , Cornelis Adrianus De Meijere , Willem Michiel De Rapper , Sjoerd Nicolaas Lambertus Donders , Jan Groenewold , Alain Louis Claude Leroux , Maxim Aleksandrovich Nasalevich , Andrey Nikipelov , Johannes Adrianus Cornelis Maria Pijnenburg , Jacobus Cornelis Gerardus Van Der Sanden
IPC分类号： G03F7/20
摘要： A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate, a cooling apparatus located in use above the substrate adjacent to the exposure area, the cooling apparatus being configured to remove heat from the substrate during use, a plasma vessel located below the cooling apparatus with its opening facing towards the cooling apparatus, and a gas supply for supplying gas to the plasma vessel and an aperture for receipt of a radiation beam. In use, supplied gas and a received radiation beam react to form a plasma within the plasma vessel that is directed towards a surface of the cooling apparatus which faces the opening of the plasma vessel.
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公开(公告)号：US20240353315A1
公开(公告)日：2024-10-24
申请号：US18759703
申请日：2024-06-28
CPC分类号： G01N21/15 , G01N21/8806 , G01N21/9501 , G02B1/18 , G02B5/0891
摘要： A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., one or more mirrors of a VUV) of a substrate inspection system is disclosed. The cleaning system ionizes or disassociates hydrogen gas in a VUV optics environment to generate hydrogen radicals (e.g., H*) or ions (e.g., H+, H2+, H3+), which remove water or hydrocarbons from the surface of the one or more mirrors. The one or more VUV mirrors may include a reflective material, such as aluminum. The one or more VUV mirrors may have a protective coating to protect the reflective material from any detrimental reaction to the hydrogen radicals or ions. The protective coating may include a noble metal.
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公开(公告)号：US12117736B2
公开(公告)日：2024-10-15
申请号：US17621472
申请日：2020-06-05
发明人： Marcus Adrianus Van De Kerkhof , Satish Achanta , Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine , Stef Marten Johan Janssens , Andrey Nikipelov
IPC分类号： G03F7/00 , G03F1/82 , H01L21/683 , H01L21/687
CPC分类号： G03F7/707 , G03F1/82 , H01L21/6831 , H01L21/68721
摘要： A lithographic apparatus comprising: a clamping surface for supporting a substrate, wherein a property of the clamping surface is defined by at least one clamping surface parameter, and wherein the property of the clamping surface has been selected to exhibit low wear; a clamping apparatus for actuating a clamping operation between the clamping surface and the substrate, wherein the clamping operation is defined at least in part by at least one interface characteristic between the clamping surface and the substrate; and a processing station, operable to apply an adjustment to a first property of the substrate to optimize at least one interface characteristic of a particular clamping operation in dependence on the clamping surface parameter and at least one substrate surface parameter which defines a second property of the substrate.
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公开(公告)号：US20220342315A1
公开(公告)日：2022-10-27
申请号：US17621472
申请日：2020-06-05
发明人： Marcus Adrianus Van De Kerkhof , Satish Achanta , Johannes Hubertus Josephina Moors , Vadim Yevgenyevich Banine , Stef Marten Johan Janssens , Andrey Nikipelov
IPC分类号： G03F7/20 , H01L21/683 , G03F1/82 , H01L21/687
摘要： A lithographic apparatus comprising: a clamping surface for supporting a substrate, wherein a property of the clamping surface is defined by at least one clamping surface parameter, and wherein the property of the clamping surface has been selected to exhibit low wear; a clamping apparatus for actuating a clamping operation between the clamping surface and the substrate, wherein the clamping operation is defined at least in part by at least one interface characteristic between the clamping surface and the substrate; and a processing station, operable to apply an adjustment to a first property of the substrate to optimize at least one interface characteristic of a particular clamping operation in dependence on the clamping surface parameter and at least one substrate surface parameter which defines a second property of the substrate.
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公开(公告)号：US11762281B2
公开(公告)日：2023-09-19
申请号：US17130537
申请日：2020-12-22
发明人： Maxim Aleksandrovich Nasalevich , Erik Achilles Abegg , Nirupam Banerjee , Michiel Alexander Blauw , Derk Servatius Gertruda Brouns , Paul Janssen , Matthias Kruizinga , Egbert Lenderink , Nicolae Maxim , Andrey Nikipelov , Arnoud Willem Notenboom , Claudia Piliego , Mária Péter , Gijsbert Rispens , Nadja Schuh , Marcus Adrianus Van De Kerkhof , Willem Joan Van Der Zande , Pieter-Jan Van Zwol , Antonius Willem Verburg , Johannes Petrus Martinus Bernardus Vermeulen , David Ferdinand Vles , Willem-Pieter Voorthuijzen , Aleksandar Nikolov Zdravkov
CPC分类号： G03F1/62 , G02B5/208 , G02B5/283 , G03F1/82 , G03F7/70191 , G03F7/70575 , G03F7/70916 , G03F7/70958 , G03F7/70983
摘要： Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.
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公开(公告)号：US11673169B2
公开(公告)日：2023-06-13
申请号：US17294013
申请日：2019-11-22
发明人： Andrey Nikipelov , Dmitry Kurilovich , Fabio Sbrizzai , Marcus Adrianus Van de Kerkhof , Ties Wouter Van der Woord , Willem Joan Van der Zande , Jeroen Van Duivenbode , David Ferdinand Vles
摘要： A membrane cleaning apparatus for removing particles from a membrane, the apparatus including a membrane support and an electric field generating mechanism. The membrane support is for supporting the membrane. The electric field generating mechanism is for generating an electric field in the vicinity of the membrane when supported by the membrane support. The electric field generating mechanism may include: one or more collector electrodes; and a mechanism for applying a voltage across a membrane supported by the membrane support and the or each of the one or more collector electrodes.
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公开(公告)号：US09773578B2
公开(公告)日：2017-09-26
申请号：US14765367
申请日：2014-01-14
发明人： Alexey Sergeevich Kuznetsov , Arjen Boogaard , Jeroen Marcel Huijbregtse , Andrey Nikipelov , Maarten Van Kampen
CPC分类号： G21K1/062 , B82Y10/00 , C23C28/34 , G03F1/24 , G03F7/70033 , G21K2201/067 , H05G2/008
摘要： A method of manufacturing a multi-layer mirror comprising a multi-layer stack of pairs of alternating layers of a first material and silicon, the method comprising depositing a stack of pairs of alternating layers of the first material and layers of silicon, the stack being supported by a substrate and doping at least a first layer of the first material with a dopant material.
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公开(公告)号：US20150296602A1
公开(公告)日：2015-10-15
申请号：US14440934
申请日：2013-10-10
发明人： Erik Roelof Loopstra , Andrei Mikhailovich Yakunin , Vadim Yevgenyevich Banine , Andrey Nikipelov , Edgar Alberto Osorio Oliveros , Alexander Matthijs Struycken , Bert Pieter Van Drieënhuizen , Jan Bernard Plechelmus Van Schoot
IPC分类号： H05G2/00
CPC分类号： H05G2/006 , G03F7/70033 , G03F7/7085 , G21K1/062 , G21K2201/067 , H01S3/073 , H01S3/08059 , H01S3/0815 , H01S3/1307 , H01S3/2232 , H01S3/2383 , H05G2/008
摘要： A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to generate a radiation generating plasma.
摘要翻译： 一种为光刻设备产生辐射的方法。 该方法包括在等离子体形成位置（12）处提供连续更新的燃料靶（50）并且引导等离子体形成位置处的连续波激发束（6），使得连续更新的燃料靶内的燃料被连续的 波激发光束产生辐射产生等离子体。
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公开(公告)号：US12055478B2
公开(公告)日：2024-08-06
申请号：US17563867
申请日：2021-12-28
CPC分类号： G01N21/15 , G01N21/8806 , G01N21/9501 , G02B1/18 , G02B5/0891
摘要： A method and apparatus for cleaning vacuum ultraviolet (VUV) optics (e.g., one or more mirrors of a VUV) of a substrate inspection system is disclosed. The cleaning system ionizes or disassociates hydrogen gas in a VUV optics environment to generate hydrogen radicals (e.g., H*) or ions (e.g., H+, H2+, H3+, which remove water or hydrocarbons from the surface of the one or more mirrors. The one or more VUV mirrors may include a reflective material, such as aluminum. The one or more VUV mirrors may have a protective coating to protect the reflective material from any detrimental reaction to the hydrogen radicals or ions. The protective coating may include a noble metal.
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10.发明授权公开(公告)号：US11287747B2
公开(公告)日：2022-03-29
申请号：US16983264
申请日：2020-08-03
发明人： Andrey Nikipelov , Patrick Sebastian Uebel , Amir Abdolvand , Sebastian Thomas Bauerschmidt , Peter Maximilian Götz , Natallia Eduardauna Uzunbajakava
IPC分类号： G03F7/20
摘要： A system and method for providing a radiation source is disclosed. In one arrangement, the radiation source includes a gas cell having a window, an optical fiber that is hollow and has an axial direction, an end thereof being enclosed within the gas cell and optically coupled to the window via an optical path, and a surface, disposed around the end of the optical fiber, and extending past the end of the optical fiber in the axial direction towards the window so as to limit one or more selected from: the exchange of gas between the optical path and the remainder of the gas cell, ingress of plasma towards or into the optical fiber, and/or radical flux towards etch-susceptible surfaces.
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