公开(公告)号：US10114298B2

公开(公告)日：2018-10-30

申请号：US15327343

申请日：2015-06-23

Applicant: ASML Netherlands B.V.

Inventor： Jan Steven Christiaan Westerlaken ,  Alexandrios Mathew ,  Rob Johan Theodoor Rutten

IPC: G03B27/42 ,  G03B27/52 ,  G03F7/20

Abstract: A conditioning system for a lithographic apparatus having a plurality of modules. The conditioning system includes a plurality of conditioning branches conveying a common conditioning medium for the plurality of modules, one conditioning branch for each module (or a subset of modules); a plurality of thermal actuators, each thermal actuator operable to locally alter the temperature of the common conditioning medium at one of the conditioning branches; and a plurality of sensors, each sensor operable to sense the temperature of the common conditioning medium at one of the conditioning branches.