公开(公告)号：US20190086814A1

公开(公告)日：2019-03-21

申请号：US16194567

申请日：2018-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Peter Johannes Bruijstens ,  Richard Joseph Bruls ,  Hans Jansen ,  Siebe Landheer ,  Laurentinus Catrinus Jorritsma ,  Arnout Johannes Meester ,  Bauke Jansen ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano Miranda ,  Maurice Martinus Johannes Van Der Lee ,  Gheorghe Tanasa ,  Lambertus Dominicus Noordam

IPC: G03F7/20 ,  G03B27/52

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

公开(公告)号：US10429741B2

公开(公告)日：2019-10-01

申请号：US16194567

申请日：2018-11-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Peter Johannes Bruijstens ,  Richard Joseph Bruls ,  Hans Jansen ,  Siebe Landheer ,  Laurentius Catrinus Jorritsma ,  Arnout Johannes Meester ,  Bauke Jansen ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano Miranda ,  Maurice Martinus Johannes Van Der Lee ,  Gheorghe Tanasa ,  Lambertus Dominicus Noordam

IPC: G03F7/20 ,  G03B27/52

Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

公开(公告)号：US10151984B2

公开(公告)日：2018-12-11

申请号：US14928891

申请日：2015-10-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Peter Johannes Bruijstens ,  Richard Joseph Bruls ,  Hans Jansen ,  Siebe Landheer ,  Laurentius Catrinus Jorritsma ,  Arnout Johannes Meester ,  Bauke Jansen ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano Miranda ,  Maurice Martinus Johannes Van Der Lee ,  Gheorghe Tanasa ,  Lambertus Dominicus Noordam

IPC: G03F7/20 ,  G03B27/52

Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

公开(公告)号：US09785061B2

公开(公告)日：2017-10-10

申请号：US15225586

申请日：2016-08-01

Applicant: ASML NETHERLANDS B.V.

Inventor： Roelof Frederik De Graaf ,  Hans Jansen ,  Bauke Jansen ,  Hubertus Leonardus Franciscus Heusschen

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/7085

Abstract: A lithographic system includes an immersion type lithographic apparatus, which includes a support constructed and arranged to support a substrate, a projection system constructed and arranged to project a patterned beam of radiation onto a target portion of the substrate, a liquid confinement structure configured to at least partially fill a space between the projection system and at least one of the substrate and support with an immersion liquid, a liquid supply system arranged to provide the immersion liquid to the liquid confinement structure, and a cleaning liquid supply system arranged to provide a cleaning liquid to a surface of the lithographic apparatus that comes into contact with the immersion liquid. The system includes a switch to provide the cleaning liquid directly to the liquid confinement structure and to provide the immersion liquid indirectly to the liquid confinement structure via a liquid purification system.

公开(公告)号：US09405205B2

公开(公告)日：2016-08-02

申请号：US14714944

申请日：2015-05-18

Applicant: ASML Netherlands B.V.

Inventor： Roelof Frederik De Graaf ,  Hans Jansen ,  Bauke Jansen ,  Hubertus Leonardus Franciscus Heusschen

IPC: G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC classification number: G03F7/70925 ,  G03F7/70341 ,  G03F7/7085

Abstract: A lithographic system includes an immersion type lithographic apparatus, which includes a support constructed and arranged to support a substrate, a projection system constructed and arranged to project a patterned beam of radiation onto a target portion of the substrate, a liquid confinement structure configured to at least partially fill a space between the projection system and at least one of the substrate and support with an immersion liquid, a liquid supply system arranged to provide the immersion liquid to the liquid confinement structure, and a cleaning liquid supply system arranged to provide a cleaning liquid to a surface of the lithographic apparatus that comes into contact with the immersion liquid. The system includes a switch to provide the cleaning liquid directly to the liquid confinement structure and to provide the immersion liquid indirectly to the liquid confinement structure via a liquid purification system.

公开(公告)号：US20160124319A1

公开(公告)日：2016-05-05

申请号：US14928891

申请日：2015-10-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Peter Johannes Bruijstens ,  Richard Joseph Bruls ,  Hans Jansen ,  Siebe Landheer ,  Laurentius Catrinus Jorritsma ,  Arnout Johannes Meester ,  Bauke Jansen ,  Ivo Adam Johannes Thomas ,  Marcio Alexandre Cano Miranda ,  Maurice Martinus Johannes Van Der Lee ,  Gheorghe Tanasa ,  Lambertus Dominicus Noordam

IPC: G03F7/20

CPC classification number: G03F7/70341 ,  G03B27/52

Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.

Abstract translation: 公开了一种光刻设备，其包括投影系统和液体限制结构，其被配置为至少部分地将浸没液体限制在由投影系统，液体限制结构和基板和/或基板台所限定的浸没空间中。 例如，在光刻设备中采取措施来减少液滴对投影系统的最终元件的影响或基本避免这种液滴的形成。