公开(公告)号：US20230298851A1

公开(公告)日：2023-09-21

申请号：US18018578

申请日：2021-07-26

Applicant: ASML Netherlands B.V.

Inventor： Chih-Yu JEN ,  Chien-Hung CHEN ,  Long MA ,  Bruno LA FONTAINE ,  Datong ZHANG

IPC: H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/24475 ,  H01J2237/2815 ,  H01J2237/24495 ,  H01J2237/2611

Abstract: A charged particle beam apparatus for inspecting a sample is provided. The apparatus includes a pixelized electron detector to receive signal electrons generated in response to an incidence of an emitted charged particle beam onto the sample. The pixelized electron detector includes multiple pixels arranged in a grid pattern. The multiple pixels may be configured to generate multiple detection signals, wherein each detection signal corresponds to the signal electrons received by a corresponding pixel of the pixelized electron detector. The apparatus further includes a controller includes circuitry configured to determine a topographical characteristic of a structure within the sample based on the detection signals generated by the multiple pixels, and identifying a defect within the sample based on the topographical characteristic of the structure of the sample.