公开(公告)号：US20240339289A1

公开(公告)日：2024-10-10

申请号：US18131840

申请日：2023-04-06

Applicant: Applied Materials Israel Ltd.

Inventor： Adar Sonn-Segev ,  Gal Bruner

IPC: H01J37/147 ,  G06T3/40 ,  G06T7/33 ,  G06T7/38 ,  G06T7/593 ,  G06T7/73 ,  G06V10/25 ,  G06V20/50 ,  H01J37/22 ,  H01J37/28 ,  H01J37/305

CPC classification number: H01J37/1478 ,  G06T3/40 ,  G06T7/33 ,  G06T7/38 ,  G06T7/596 ,  G06T7/73 ,  G06V10/25 ,  G06V20/50 ,  H01J37/222 ,  H01J37/28 ,  H01J37/305 ,  G06T2207/10012 ,  G06T2207/10061 ,  G06T2207/30204 ,  H01J2237/2611 ,  H01J2237/2815 ,  H01J2237/31749

Abstract: A method of determining a depth of a hole milled into a first region of a sample, comprising: positioning the sample in a processing chamber having a charged particle beam column; milling a hole in the first region of the sample using a charged particle beam generated by the charged particle beam column; identifying a first registration mark at an upper level of the milled hole; identifying a second registration mark at a lower level of the milled hole; taking a first set of images at a first tilt angle, the first set of images including a first image taken with a field of view that captures the first registration mark but not the second registration mark, and a second image taken with a field of view that captures the second registration mark but not the first registration mark; taking a second set of images at a second tilt angle, different than the first tilt angle, the second set of images including a third image taken with a field of view that captures the first registration mark but not the second registration mark, and a fourth image taken with a field of view that captures the second registration mark but not the first registration mark; using stereoscopic measurement techniques to determine the depth of the hole based on the first and second sets of images.

公开(公告)号：US10020160B2

公开(公告)日：2018-07-10

申请号：US15417887

申请日：2017-01-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Koichi Kuroda ,  Hajime Kawano ,  Makoto Suzuki ,  Yuzuru Mizuhara

IPC: G01N23/00 ,  H01J37/00 ,  H01J3/10 ,  H01J37/147 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2806 ,  H01J2237/2815

Abstract: An object of the present invention is to provide a charged particle beam device which can realize improved contrast of an elongated pattern in a specific direction, such as a groove-like pattern. In order to achieve the above-described object, the present invention proposes a charged particle beam device including a detector for detecting a charged particle obtained based on a charged particle beam discharged to a sample. The charged particle beam device includes a charged particle passage restricting member that has at least one of an arcuate groove and a groove having a longitudinal direction in a plurality of directions, and a deflector that deflects the charged particle discharged toward the groove from the sample. The charged particle discharged from the sample is deflected to a designated position of the groove.

公开(公告)号：US20170221672A1

公开(公告)日：2017-08-03

申请号：US15417887

申请日：2017-01-27

Applicant: Hitachi High-Technologies Corporation

Inventor： Koichi KURODA ,  Hajime KAWANO ,  Makoto SUZUKI ,  Yuzuru MIZUHARA

IPC: H01J37/147 ,  H01J37/28 ,  H01J37/244

CPC classification number: H01J37/147 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/2806 ,  H01J2237/2815

Abstract: An object of the present invention is to provide a charged particle beam device which can realize improved contrast of an elongated pattern in a specific direction, such as a groove-like pattern. In order to achieve the above-described object, the present invention proposes a charged particle beam device including a detector for detecting a charged particle obtained based on a charged particle beam discharged to a sample. The charged particle beam device includes a charged particle passage restricting member that has at least one of an arcuate groove and a groove having a longitudinal direction in a plurality of directions, and a deflector that deflects the charged particle discharged toward the groove from the sample. The charged particle discharged from the sample is deflected to a designated position of the groove.

公开(公告)号：US09448253B2

公开(公告)日：2016-09-20

申请号：US14719193

申请日：2015-05-21

Applicant: Applied Materials Israel, Ltd.

Inventor： Konstantin Chirko ,  Alon Litman

IPC: H01J37/00 ,  G01Q60/30 ,  G01Q30/02 ,  H01J37/28

CPC classification number: G01Q60/30 ,  G01Q30/02 ,  H01J37/28 ,  H01J2237/281 ,  H01J2237/2815

Abstract: A system, method and a non-transitory compute readable medium for evaluating a high aspect ratio (HAR) hole having a nanometric scale width and formed in a substrate, including obtaining, during an illumination period, multiple measurement results by an electrostatic measurement device that comprises a probe tip that is placed in proximity to the HAR hole; wherein multiple locations within the HAR hole are illuminated with a beam of charged particles during the illumination period; and processing the multiple measurement results to determine a state of the HAR hole.

Abstract translation: 一种用于评估具有纳米尺度宽度并形成在衬底中的高纵横比（HAR）孔的系统，方法和非暂时计算可读介质，包括在照明周期期间通过静电测量装置获得多个测量结果， 包括放置在靠近HAR孔的探针尖端; 其中所述HAR孔内的多个位置在照明周期期间用带电粒子束照射; 并处理多个测量结果以确定HAR孔的状态。

公开(公告)号：US20090001279A1

公开(公告)日：2009-01-01

申请号：US12163121

申请日：2008-06-27

Applicant: Atsushi KOBARU

Inventor： Atsushi KOBARU

IPC: H01J3/14

CPC classification number: H01J37/28 ,  H01J37/21 ,  H01J2237/21 ,  H01J2237/281 ,  H01J2237/2815

Abstract: A charged particle beam apparatus for measuring and inspecting a sample having some parts in focus and other parts out of focus in an image due to the effect of the roughness of the sample surface is disclosed, in which in order to acquire a clear image of the whole or a predetermined area in the image, the focus adjustment conditions for each point in the area to be scanned by the charged particle beam are determined in advance, and the focus adjustment conditions thus determined are applied selectively to the patterns formed under the same fabrication conditions as the sample for which the focus adjustment conditions are determined.

Abstract translation: 公开了一种带电粒子束装置，用于测量和检查由于样品表面的粗糙度的影响而在图像中具有焦点部分和其他部分焦点的样品的样品，其中为了获得样品表面的清晰图像 整个或预定区域，预先确定要由被带电粒子束扫描的区域中的每个点的焦点调整条件，并且将如此确定的聚焦调节条件选择性地施加到在相同制造下形成的图案 作为确定焦点调整条件的样本的条件。

公开(公告)号：US07381978B2

公开(公告)日：2008-06-03

申请号：US11051339

申请日：2005-02-03

Applicant: Alexander Kadyshevitch ,  Chris Talbot ,  Dmitry Shur ,  Andreas G. Hegedus

Inventor： Alexander Kadyshevitch ,  Chris Talbot ,  Dmitry Shur ,  Andreas G. Hegedus

IPC: H01J49/00

CPC classification number: H01J37/32935 ,  G01N23/00 ,  H01J2237/281 ,  H01J2237/2815 ,  H01L21/67253 ,  H01L22/12 ,  H01L22/34 ,  H01L2924/3011

Abstract: A method for process monitoring includes receiving a sample having a first layer that is at least partially conductive and a second layer formed over the first layer, following production of contact openings in the second layer by an etch process, the contact openings including a plurality of test openings having different, respective transverse dimensions. A beam of charged particles is directed to irradiate the test openings. In response to the beam, at least one of a specimen current flowing through the first layer and a total yield of electrons emitted from a surface of the sample is measured, thus producing an etch indicator signal. The etch indicator signal is analyzed as a function of the transverse dimensions of the test openings so as to assess a characteristic of the etch process.

Abstract translation: 一种用于过程监测的方法包括接收具有至少部分导电的第一层的样品和在第一层上形成的第二层，在通过蚀刻工艺生产第二层中的接触开口之后，接触开口包括多个 测试孔具有不同的相应的横向尺寸。 带电粒子的束被引导以照射测试孔。 响应于光束，测量流过第一层的样本电流和从样品表面发射的电子的总产率中的至少一个，从而产生蚀刻指示符信号。 作为测试开口的横向尺寸的函数分析蚀刻指示符信号，以便评估蚀刻工艺的特性。

公开(公告)号：US20070023657A1

公开(公告)日：2007-02-01

申请号：US11515732

申请日：2006-09-06

Applicant: Atsushi Takane ,  Haruo Yoda ,  Hideo Todokoro ,  Fumio Mizuno ,  Shoji Yoshida ,  Mitsuji Ikeda ,  Mitsugu Sato ,  Makoto Ezumi

Inventor： Atsushi Takane ,  Haruo Yoda ,  Hideo Todokoro ,  Fumio Mizuno ,  Shoji Yoshida ,  Mitsuji Ikeda ,  Mitsugu Sato ,  Makoto Ezumi

IPC: G21K7/00

CPC classification number: G06T5/002 ,  G06T5/003 ,  G06T5/20 ,  G06T5/50 ,  G06T7/13 ,  G06T7/62 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/21 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/21 ,  H01J2237/216 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

Abstract: It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus condition of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles irradiated from a surface portion of said sample in response to the emitted charged particle beam, and means for composing a two-dimensional image of the surface portion of the sample based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.

Abstract translation: 本发明的目的是获得一种聚焦于样品的所有部分的图像，并提供一种能够获得在整个样品上没有模糊部分的二维图像的带电粒子束装置。 为了实现上述目的，本发明包括用于改变从带电粒子源发射的带电粒子束的聚焦条件的装置，用于检测从所述样品的表面部分照射的带电粒子的带电粒子检测器， 发射的带电粒子束，以及用于基于所述带电粒子束聚焦的信号来组合样品的表面部分的二维图像的装置，所述信号在从带电粒子检测器输出的信号中。

公开(公告)号：US07038224B2

公开(公告)日：2006-05-02

申请号：US10434977

申请日：2003-05-09

Applicant: Alexander Kadyshevitch ,  Chris Talbot ,  Dmitry Shur ,  Andreas G. Hegedus

Inventor： Alexander Kadyshevitch ,  Chris Talbot ,  Dmitry Shur ,  Andreas G. Hegedus

IPC: G01R31/02

CPC classification number: H01J37/32935 ,  G01N23/00 ,  H01J2237/281 ,  H01J2237/2815 ,  H01L21/67253 ,  H01L22/12 ,  H01L22/34 ,  H01L2924/3011

Abstract: A method for process monitoring includes receiving a sample having a first layer that is at least partially conductive and a second layer formed over the first layer, following production of contact openings in the second layer by an etch process, the contact openings including a plurality of test openings having different, respective transverse dimensions. A beam of charged particles is directed to irradiate the test openings. In response to the beam, at least one of a specimen current flowing through the first layer and a total yield of electrons emitted from a surface of the sample is measured, thus producing an etch indicator signal. The etch indicator signal is analyzed as a function of the transverse dimensions of the test openings so as to assess a characteristic of the etch process.

公开(公告)号：US20050184237A1

公开(公告)日：2005-08-25

申请号：US11108731

申请日：2005-04-19

Applicant: Atsushi Takane ,  Haruo Yoda ,  Hideo Todokoro ,  Fumio Mizuno ,  Shoji Yoshida ,  Mitsuji Ikeda ,  Mitsugu Sato ,  Makoto Ezumi

Inventor： Atsushi Takane ,  Haruo Yoda ,  Hideo Todokoro ,  Fumio Mizuno ,  Shoji Yoshida ,  Mitsuji Ikeda ,  Mitsugu Sato ,  Makoto Ezumi

IPC: G01Q10/00 ,  G01Q30/04 ,  G01Q30/02 ,  H01J37/22 ,  H01J3/14 ,  G01N23/00

CPC classification number: G06T5/002 ,  G06T5/003 ,  G06T5/20 ,  G06T5/50 ,  G06T7/13 ,  G06T7/62 ,  G06T2207/10061 ,  G06T2207/30148 ,  H01J37/21 ,  H01J37/222 ,  H01J37/28 ,  H01J2237/21 ,  H01J2237/216 ,  H01J2237/221 ,  H01J2237/226 ,  H01J2237/281 ,  H01J2237/2815 ,  H01J2237/2817

Abstract: It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus condition of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles [obtained at] irradiated from a surface portion of said sample [irradiated with] in response to the emitted charged particle beam, and means for composing a two-dimensional image of the surface portion of the sample [as viewed from a direction of said charged particle beam source,] based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.

Abstract translation: 本发明的目的是获得一种聚焦于样品的所有部分的图像，并提供一种能够获得在整个样品上没有模糊部分的二维图像的带电粒子束装置。 为了实现上述目的，本发明包括用于改变从带电粒子源发射的带电粒子束的聚焦条件的装置，用于检测从所述样品的表面部分照射的带电粒子的带电粒子检测器 根据所发射的带电粒子束进行[照射]，以及用于构成样品表面部分（从所述带电粒子束源的方向观察）的二维图像的装置，基于所述带电粒子束的信号 粒子束被聚焦，所述信号在从带电粒子检测器输出的信号中。

公开(公告)号：US20050151078A1

公开(公告)日：2005-07-14

申请号：US11056191

申请日：2005-02-14

Applicant: Atsushi Takane ,  Satoru Yamaguchi ,  Osamu Komuro ,  Yasuhiko Ozawa ,  Hideo Todokoro

Inventor： Atsushi Takane ,  Satoru Yamaguchi ,  Osamu Komuro ,  Yasuhiko Ozawa ,  Hideo Todokoro

IPC: G01B15/04 ,  G01B15/08 ,  H01J37/28 ,  H01L21/66 ,  G01N23/00

CPC classification number: H01J37/28 ,  H01J2237/2815

Abstract: A method for determining a depression/protrusion, especially of a line and space pattern formed on a sample, and an apparatus therefor. A charged particle beam is scanned with its direction being inclined to the original optical axis of the charged particle beam or a sample stage is inclined, broadening of a detected signal in a line scanning direction of the charged particle beam is measured, the broadening is compared with that when the charged particle beam is scanned with its direction being parallel to the original optical axis of the charged particle beam, and a depression/protrusion of the scanned portion is determined on the basis of increase/decrease of the broadening.

Abstract translation: 用于确定凹陷/突起的方法，特别是用于形成在样本上的线和空间图案及其装置。 扫描带电粒子束的方向与带电粒子束的原始光轴倾斜，或者样品台倾斜，测量带电粒子束的扫描方向上的检测信号的变宽，比较加宽 其中当带电粒子束的扫描方向平行于带电粒子束的原始光轴时，并且基于增宽的增加/减小来确定扫描部分的凹陷/突起。