公开(公告)号：US12253807B2

公开(公告)日：2025-03-18

申请号：US18000299

申请日：2021-04-19

Applicant: ASML Netherlands B.V.

Inventor： Andrey Valerievich Rogachevskiy ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Doru Cristian Torumba ,  Arjan Gijsbertsen ,  Cristina Caresio ,  Raymund Centeno ,  Tabitha Wangari Kinyanjui ,  Jan Arie Den Boer

IPC: G03F9/00 ,  G01C5/00 ,  G06T7/246

Abstract: The present invention provides a method for calculating a corrected substrate height map of a first substrate using a height level sensor. The method comprises: sampling the first substrate by means of the height level sensor with the first substrate moving with a first velocity, wherein the first velocity is a first at least partially non-constant velocity of the first substrate with respect to the height level sensor, to generate a first height level data, generating a first height map based on the first height level data, and calculating a corrected substrate height map by subtracting a correction map from the first height map, wherein the correction map is calculated from the difference between a first velocity height map and a second velocity height map.