公开(公告)号：US11662669B2

公开(公告)日：2023-05-30

申请号：US17625466

申请日：2020-06-15

Applicant: ASML Netherlands B.V.

Inventor： Andrey Valerievich Rogachevskiy ,  Martin Jules Marie-Emile De Nivelle ,  Arjan Gijsbertsen ,  Willem Richard Pongers ,  Viktor Trogrlic

IPC: G03F9/00 ,  G03F7/20

CPC classification number: G03F9/7092 ,  G03F7/7085 ,  G03F9/7026 ,  G03F9/7034

Abstract: An apparatus for measuring a height of a substrate for processing in a lithographic apparatus is disclosed. The apparatus comprises a first sensor for sensing a height of the substrate over a first area. The apparatus also comprises a second sensor for sensing a height of the substrate over a second area. The apparatus further comprises a processor adapted to normalize first data corresponding to a signal from the first sensor with a second sensor footprint to produce a first normalized height data, and to normalize second data corresponding to a signal from the second sensor with a first sensor footprint to produce a second normalized height data. The processor is adapted to determine a correction to a measured height of the substrate based on a difference between the first and second normalized height data.

公开(公告)号：US12253807B2

公开(公告)日：2025-03-18

申请号：US18000299

申请日：2021-04-19

Applicant: ASML Netherlands B.V.

Inventor： Andrey Valerievich Rogachevskiy ,  Bastiaan Andreas Wilhelmus Hubertus Knarren ,  Doru Cristian Torumba ,  Arjan Gijsbertsen ,  Cristina Caresio ,  Raymund Centeno ,  Tabitha Wangari Kinyanjui ,  Jan Arie Den Boer

IPC: G03F9/00 ,  G01C5/00 ,  G06T7/246

Abstract: The present invention provides a method for calculating a corrected substrate height map of a first substrate using a height level sensor. The method comprises: sampling the first substrate by means of the height level sensor with the first substrate moving with a first velocity, wherein the first velocity is a first at least partially non-constant velocity of the first substrate with respect to the height level sensor, to generate a first height level data, generating a first height map based on the first height level data, and calculating a corrected substrate height map by subtracting a correction map from the first height map, wherein the correction map is calculated from the difference between a first velocity height map and a second velocity height map.

公开(公告)号：US09519224B2

公开(公告)日：2016-12-13

申请号：US14351012

申请日：2012-09-21

Applicant: ASML Netherlands B.V.

Inventor： Arjan Gijsbertsen ,  Hubertus Antonius Geraets ,  Bart Peter Bert Segers ,  Natalia Viktorovna Davydova

IPC: G03F7/20 ,  G03F9/00 ,  G01T1/02

CPC classification number: G03F7/702 ,  G01T1/02 ,  G03F7/70558 ,  G03F7/70625 ,  G03F7/70641 ,  G03F9/7026 ,  G03F9/7084

Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device, the patterning device being capable of imparting an EUV radiation beam with a grating in its cross-section to form a patterned EUV radiation beam, and a projection system configured to project the patterned EUV radiation beam onto a target portion of the substrate, wherein the support structure is provided with a grating comprising a series of first reflective portions which alternates with a series of second reflective portions, the second reflective portions having a reflectivity which is less than the reflectivity of at least part of the first reflective portions and which is greater than zero.

Abstract translation: 一种光刻设备，包括被构造成支撑图案形成装置的支撑结构，所述图案形成装置能够在其横截面中赋予具有光栅的EUV辐射束以形成图案化的EUV辐射束，以及投影系统， EUV辐射束到基板的目标部分上，其中支撑结构设置有包括与一系列第二反射部分交替的一系列第一反射部分的光栅，第二反射部分的反射率小于反射率 的至少部分的第一反射部分并且大于零。

公开(公告)号：US20140313496A1

公开(公告)日：2014-10-23

申请号：US14351012

申请日：2012-09-21

Applicant: ASML Netherlands B.V.

Inventor： Arjan Gijsbertsen ,  Hubertus Antonius Geraets ,  Bart Peter Bert Segers ,  Natalia Victorovna Davydova

IPC: G03F7/20 ,  G01T1/02

CPC classification number: G03F7/702 ,  G01T1/02 ,  G03F7/70558 ,  G03F7/70625 ,  G03F7/70641 ,  G03F9/7026 ,  G03F9/7084

Abstract: A lithographic apparatus comprising a support structure constructed to support a patterning device, the patterning device being capable of imparting an EUV radiation beam with a grating in its cross-section to form a patterned EUV radiation beam, and a projection system configured to project the patterned EUV radiation beam onto a target portion of the substrate, wherein the support structure is provided with a grating comprising a series of first reflective portions which alternates with a series of second reflective portions, the second reflective portions having a reflectivity which is less than the reflectivity of at least part of the first reflective portions and which is greater than zero.

Abstract translation: 一种光刻设备，包括被构造成支撑图案形成装置的支撑结构，所述图案形成装置能够在其横截面中赋予具有光栅的EUV辐射束以形成图案化的EUV辐射束，以及投影系统， EUV辐射束到基板的目标部分上，其中支撑结构设置有包括与一系列第二反射部分交替的一系列第一反射部分的光栅，第二反射部分的反射率小于反射率 的至少部分的第一反射部分并且大于零。