公开(公告)号：US11421729B2

公开(公告)日：2022-08-23

申请号：US17421694

申请日：2019-12-12

Applicant: ASML Netherlands B.V.

Inventor： Erwin Andreas Bernardus Mulder ,  Krijn Frederik Bustraan ,  Antonius Franciscus Johannes De Groot ,  Rinze Koolstra ,  Paul Peter Anna Antonius Brom

IPC: F16C11/12 ,  G03F7/20

Abstract: The invention relates to elastic guiding device to support a mass with respect to a base in a support direction, wherein the stiffness in support direction compared to stiffness in other direction, for example the stiffness in vertical direction compared to the stiffness in horizontal directions is substantially increased. The invention further relates to a positioning device comprising at least one elastic guiding device, and a lithographic apparatus comprising such positioning device.