公开(公告)号：US20140293251A1

公开(公告)日：2014-10-02

申请号：US14305110

申请日：2014-06-16

Applicant: ASML Netherlands B.V.

Inventor： Hans Butler ,  Robertus Johannes Marinus De Jongh ,  Hendrik Koevoets ,  Marco Hendrikus Hermanu Oude Nijhuis ,  Robertus Leonardus Tousain ,  Marc Wilhelmus Maria Van Der Wijst ,  Cornelius Adrianus Lambertus De Hoon

IPC: G03F9/00

CPC classification number: G03F9/7096 ,  G03F7/70516 ,  G03F7/7055

Abstract: A projection system is provided that includes a sensor system that measures at least one parameter that relates to the physical deformation of a frame that supports the optical elements within the projection system, and a control system that, based on the measurements from the sensor system, determines an expected deviation of the position of the beam of radiation projected by the projection system that is caused by the physical deformation of the frame.

Abstract translation: 提供一种投影系统，该投影系统包括测量与支撑投影系统内的光学元件的框架的物理变形有关的至少一个参数的传感器系统;以及控制系统，其基于来自传感器系统的测量结果， 确定由框架的物理变形引起的由投影系统投射的辐射束的位置的预期偏差。