公开(公告)号：US20190033727A1

公开(公告)日：2019-01-31

申请号：US16026507

申请日：2018-07-03

Applicant: ASML Netherlands B.V.

Inventor： Marc Johannes NOOT ,  Simon Gijsbert Josephus MATHIJSSEN ,  Kaustuve BHATTACHARYYA ,  Jinmoo BYUN ,  Hyun-Su KIM ,  Won-Jae JANG ,  Timothy Dugan DAVIS

IPC: G03F7/20

Abstract: Disclosed are a method, computer program and a metrology apparatus for measuring a process effect parameter relating to a manufacturing process for manufacturing integrated circuits on a substrate. The method comprises determining for a structure, a first quality metric value for a quality metric from a plurality of measurement values each relating to a different measurement condition while cancelling or mitigating for the effect of the process effect parameter on the plurality of measurement values and a second quality metric value for the quality metric from at least one measurement value relating to at least one measurement condition without cancelling or mitigating for the effect of the process effect parameter on the at least one measurement value. The process effect parameter value for the process effect parameter can then be calculated from the first quality metric value and the second quality metric value, for example by calculating their difference.

公开(公告)号：US20240152059A1

公开(公告)日：2024-05-09

申请号：US18281519

申请日：2022-03-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Dogacan KARA ,  Erik JENSEN ,  Jochem Sebastiaan WILDENBERG ,  David Frans Simon DECKERS ,  Sila GULER ,  Reinaldo Antonio ASTUDILLO RENGIFO ,  Yasri YUDHISTIRA ,  Gijs HILHORST ,  David Ricardo CAICEDO FERNANDEZ ,  Frans Reinier SPIERING ,  Sinatra Canggih KHO ,  Herman Martin BLOM ,  Sang Uk KIM ,  Hyun-Su KIM

IPC: G03F7/00

CPC classification number: G03F7/705 ,  G03F7/70633

Abstract: A method for determining a substrate model for describing a first measurement dataset and a second measurement dataset relating to a performance parameter. The method include obtaining candidate basis functions for a plurality of substrate models. Steps 1 to 4 are performed iteratively for the first measurement dataset and the second measurement dataset until at least one stopping criterion is met so as to determine the substrate model, the steps including: 1. selecting a candidate basis function from the candidate basis functions; 2. updating a substrate model by adding the candidate basis function into this substrate model to obtain an updated substrate model; 3. evaluating the updated substrate model based on the first measurement dataset and/or second measurement dataset; and 4. determining whether to include the basis function within the substrate model based on the evaluation.