公开(公告)号：US11581161B2

公开(公告)日：2023-02-14

申请号：US16727706

申请日：2019-12-26

Applicant: ASML Netherlands B.V.

Inventor： Jie Fang ,  Yixiang Wang ,  Qirong Zhang ,  Haojie Zhang ,  Jinmei Yang ,  Fenghui Zhu

IPC: H01J37/26 ,  C25F3/14

Abstract: A method of processing a workpiece may include forming a first layer on a first side of a base layer. The base layer may be part of a substrate including a plurality of layers. The method may also include forming a second layer on the first layer. A material of the second layer may include metal. The method may also include forming an opening in the second layer, forming an opening in the first layer by etching, and removing the second layer. The method may include dry etching of the first layer.

公开(公告)号：US12142456B2

公开(公告)日：2024-11-12

申请号：US17638777

申请日：2020-08-20

Applicant: ASML Netherlands B.V.

Inventor： Jinmei Yang ,  Jian Zhang ,  Zhiwen Kang ,  Yixiang Wang

IPC: H01J37/28 ,  G01N23/2251 ,  H01J37/26

Abstract: A sensor may be used to measure a degree of tilt of a sample. The sensor may include an apparatus having a light source, first, second, and third optical elements, a lens, and an aperture. The first optical element may supply light from the light source toward the sample, and may supply light input into the first optical element from the sample toward the second optical element. The second optical element may supply light toward first and second sensing elements. An aperture may be arranged on a focal plane of the lens. A light beam incident on the first sensing element may be a reference beam.