公开(公告)号：US20230020745A1

公开(公告)日：2023-01-19

申请号：US17952115

申请日：2022-09-23

申请人： ASML Netherlands B.V.

发明人： Arjen Benjamin STORM ,  Johan Frederik Cornelis VAN GURP ,  Johannes Cornelis Jacobus DE LANGEN ,  Aaron Yang-Fay AYAL ,  Michiel Matthieu BRUININK ,  Christiaan Ruben VAN DEN BERG ,  Christiaan OTTEN ,  Laura DINU GURTLER ,  Marc SMITS

IPC分类号： H01J37/317 ,  G03F9/00 ,  H01J37/20 ,  H01J37/28 ,  H01J37/153 ,  H01J37/09

摘要： Disclosed herein is a substrate stack comprising a plurality of substrates, wherein: each substrate in the substrate stack comprises at least one alignment opening set; the at least one alignment opening set in each substrate is aligned for a light beam to pass through corresponding alignment openings in each substrate; and each substrate comprises at least one alignment opening that has a smaller diameter than the corresponding alignment openings in the other substrates.

公开(公告)号：US20210237129A1

公开(公告)日：2021-08-05

申请号：US17238124

申请日：2021-04-22

申请人： ASML Netherlands B.V.

发明人： Marc SMITS ,  Johan Joost KONING ,  Chris Franciscus Jessica LODEWIJK ,  Hindrik Willem MOOK ,  Ludovic LATTARD

IPC分类号： B08B7/04 ,  H01J37/02 ,  H01J37/317 ,  B08B17/02 ,  H01J37/147 ,  H01J37/18

摘要： A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture.
Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

公开(公告)号：US20210391139A1

公开(公告)日：2021-12-16

申请号：US17344446

申请日：2021-06-10

申请人： ASML Netherlands B.V.

发明人： Christiaan OTTEN ,  Peter-Paul CRANS ,  Marc SMITS ,  Laura DEL TIN ,  Christan TEUNISSEN ,  Yang-Shan HUANG ,  Stijn Wilem, Herman, Karel STEENBRINK ,  Xuerang HU ,  Qingpo XI ,  Xinan LUO ,  Xuedong LIU

IPC分类号： H01J37/20 ,  H01J37/28 ,  H01J37/18 ,  H01J37/14 ,  H01J37/147 ,  H01J37/244

摘要： Disclosed herein is a module for supporting a device configured to manipulate charged particle paths in a charged particle apparatus, the module comprising: a support arrangement configured to support the device, wherein the device is configured to manipulate a charged particle path within the charged particle apparatus; and a support positioning system configured to move the support arrangement within the module; wherein the module is arranged to be field replaceable in the charged particle apparatus.

公开(公告)号：US20200230665A1

公开(公告)日：2020-07-23

申请号：US16841547

申请日：2020-04-06

申请人： ASML Netherlands B.V.

发明人： Marc SMITS ,  Johan Joost KONING ,  Chris Franciscus Jessica LODEWIJK ,  Hindrik Willem MOOK ,  Ludovic LATTARD

IPC分类号： B08B7/04 ,  H01J37/18 ,  H01J37/147 ,  B08B17/02 ,  H01J37/317 ,  H01J37/02

摘要： A charged particle beam system is disclosed, comprising: a charged particle beam generator for generating a beam of charged particles; a charged particle optical column arranged in a vacuum chamber, wherein the charged particle optical column is arranged for projecting the beam of charged particles onto a target, and wherein the charged particle optical column comprises a charged particle optical element for influencing the beam of charged particles; a source for providing a cleaning agent; a conduit connected to the source and arranged for introducing the cleaning agent towards the charged particle optical element; wherein the charged particle optical element comprises: a charged particle transmitting aperture for transmitting and/or influencing the beam of charged particles, and at least one vent hole for providing a flow path between a first side and a second side of the charged particle optical element, wherein the vent hole has a cross section which is larger than a cross section of the charged particle transmitting aperture. Further, a method for preventing or removing contamination in the charged particle transmitting apertures is disclosed, comprising the step of introducing the cleaning agent while the beam generator is active.

公开(公告)号：US20200209763A1

公开(公告)日：2020-07-02

申请号：US16812175

申请日：2020-03-06

申请人： ASML Netherlands B.V.

发明人： Marc SMITS

IPC分类号： G03F7/20

摘要： Methods and arrangement for clamping substrates to a support using adhesive material area disclosed.The method comprises providing a support comprising a first surface defining a plane; applying adhesive material on at least portions of the first surface; and placing the substrate onto the adhesive material, wherein the adhesive material forms a plurality of support locations supporting the substrate. Preferably the adhesive material is cured at least partly during the application of a substantially uniformly distributed force to the substrate in the direction of the support.The arrangements comprise a support comprising a first surface, for supporting the substrate via adhesive material, whereby the first surface defines a plane. Preferably it also comprises an arrangement for providing electromagnetic radiation, thermal energy, and/or a chemical substance to the adhesive material, and an arrangement for providing a substantially uniformly distributed force to the substrate in the direction of the support.