公开(公告)号：US12249481B2

公开(公告)日：2025-03-11

申请号：US17535453

申请日：2021-11-24

Applicant: ASML Netherlands B.V.

Inventor： Mark Henricus Wilhelmus Van Gerven ,  Johannes Hubertus Antonius Van De Rijdt ,  Michaël Johannes Christiaan Ronde ,  Niels Johannes Maria Bosch

IPC: H01J37/20 ,  H01J37/26 ,  H01J37/28

Abstract: Systems directed to a stage apparatus in an electron beam inspection tool to inspect a sample are disclosed. The stage apparatus comprises a short stroke stage; a long stroke stage; a first sensor configured to measure a position of the short stroke stage with respect to a measurement reference; one or more roller bearings configured to support the long stroke stage; and a controller having circuitry and configured to control a motion of the long stroke stage and a motion of the short stroke stage for following movement of the reference at least partly based on measurement from the first sensor, wherein the controller is operable such that control of the long stroke stage is decoupled from the movement of the reference in at least a part of operation of the stage apparatus for reducing debris generation of the one or more roller bearings.

公开(公告)号：US09329502B2

公开(公告)日：2016-05-03

申请号：US13861053

申请日：2013-04-11

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Christopher Charles Ward ,  Mark Henricus Wilhelmus Van Gerven ,  Bram Paul Theodoor Van Goch

IPC: G03F7/20 ,  F16F15/00

CPC classification number: G03F7/709 ,  F16F15/002 ,  G03F7/70525 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70775

Abstract: A lithographic apparatus can include a component and a positioning system operatively coupled and configured to move the component along a first axis. The positioning system can be configured to measure a position of the component along a second axis or a third axis. The positioning system can also be configured to control movement of the component so as to compensate for an effect of eigenmode coupling between the movement of the component along the first axis and the measured position of the component along the second axis or the third axis. In some embodiments, the component is a reticle stage or a wafer stage.

Abstract translation: 光刻设备可以包括可操作地联接和配置成沿着第一轴线移动部件的部件和定位系统。 定位系统可以被配置成沿着第二轴线或第三轴线测量部件的位置。 定位系统还可以被配置为控制部件的移动，以便补偿沿着第一轴线的部件的运动与沿着第二轴线或第三轴线的部件的测量位置之间的本征模式耦合的影响。 在一些实施例中，组件是掩模版阶段或晶片台。