公开(公告)号：US20200381211A1

公开(公告)日：2020-12-03

申请号：US16885872

申请日：2020-05-28

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Xuerang HU ,  Zhong-wei CHEN ,  Martinus Gerardus Johannes Maria MAASSEN

IPC: H01J37/317 ,  H01J37/145 ,  H01J37/28

Abstract: Systems and methods of mitigating Coulomb effect in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam along a primary optical axis, a first aperture array comprising a first plurality of apertures having shapes and configured to generate a plurality of primary beamlets derived from the primary charged-particle beam, a condenser lens comprising a plane adjustable along the primary optical axis, and a second aperture array comprising a second plurality of apertures configured to generate probing beamlets corresponding to the plurality of beamlets, wherein each of the plurality of probing beamlets comprises a portion of charged particles of a corresponding primary beamlet based on at least a position of the plane of the condenser lens and a characteristic of the second aperture array.

公开(公告)号：US20240145214A1

公开(公告)日：2024-05-02

申请号：US18504089

申请日：2023-11-07

Applicant: ASML Netherlands B.V.

Inventor： Weiming REN ,  Xuedong LIU ,  Xuerang HU ,  Zhong-wei CHEN ,  Martinus Gerardus Johannes Maria MAASSEN

IPC: H01J37/317 ,  H01J37/145 ,  H01J37/28

CPC classification number: H01J37/3177 ,  H01J37/145 ,  H01J37/28 ,  H01J2237/0453

Abstract: Systems and methods of mitigating Coulomb effect in a multi-beam apparatus are disclosed. The multi-beam apparatus may include a charged-particle source configured to generate a primary charged-particle beam along a primary optical axis, a first aperture array comprising a first plurality of apertures having shapes and configured to generate a plurality of primary beamlets derived from the primary charged-particle beam, a condenser lens comprising a plane adjustable along the primary optical axis, and a second aperture array comprising a second plurality of apertures configured to generate probing beamlets corresponding to the plurality of beamlets, wherein each of the plurality of probing beamlets comprises a portion of charged particles of a corresponding primary beamlet based on at least a position of the plane of the condenser lens and a characteristic of the second aperture array.

公开(公告)号：US20230086984A1

公开(公告)日：2023-03-23

申请号：US17909352

申请日：2021-02-24

Applicant: ASML Netherlands B.V.

Inventor： Te-Yu CHEN ,  Martinus Gerardus Johannes Maria MAASSEN

IPC: H01J37/28 ,  H01J37/29

Abstract: Apparatuses, systems, and methods for beam array geometry optimization of a multi-beam inspection tool are disclosed. In some embodiments, a microelectromechanical system (MEMS) may include a first row of apertures; a second row of apertures positioned below the first row of apertures; a third row of apertures positioned below the second row of apertures; and a fourth row of apertures positioned below the third row of apertures; wherein the first, second, third, and fourth rows are parallel to each other in a first direction; the first and third rows are offset from the second and fourth rows in a second direction that is perpendicular to the first direction; the first and third rows have a first length; the second and fourth rows have a second length; and the first length is longer than the second length in the second direction.

公开(公告)号：US20230019113A1

公开(公告)日：2023-01-19

申请号：US17785890

申请日：2020-12-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Martinus Gerardus Johannes Maria MAASSEN

IPC: H01J37/28 ,  H01J37/04

Abstract: Apparatuses, systems, and methods for multi-modal operations of a multi-beam inspection system are disclosed. An apparatus for generating multi-modal beamlets may include an aperture array which includes a first group of apertures having a first size and a second group of apertures having a second size different from the first size, the second group of apertures adjoining the first group of apertures, in which the first group of apertures and the second group of apertures are in different pass-or-block statuses. A multi-beam apparatus of multi-modal inspection operations may include the aforementioned apparatus, a source configured to emit charged particles, a condenser system configured to set a projection area of the charged particles, and circuitry for controlling the first and second groups of apertures.