公开(公告)号：US20200027763A1

公开(公告)日：2020-01-23

申请号：US16514843

申请日：2019-07-17

Applicant: ASML Netherlands B.V.

Inventor： Jeroen Gerard GOSEN ,  Te-Yu CHEN ,  Dennis Herman, Caspar VAN BANNING ,  Edwin Cornelis KADIJK ,  Martijn Petrus, Christianus VAN HEUMEN ,  Erheng WANG ,  Johannes Andreas, Henricus, Maria JACOBS

IPC: H01L21/67 ,  G03F7/20

Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.

公开(公告)号：US20250037961A1

公开(公告)日：2025-01-30

申请号：US18714936

申请日：2022-11-02

Applicant: ASML Netherlands B.V.

Inventor： Martin Frans, Pierre SMEETS ,  Niels Johannes, Maria BOSCH ,  Willem Petrus VAN AAKEN ,  Jef GOOSSENS ,  Te-Yu CHEN ,  Funda SAHIN

IPC: H01J37/153 ,  H01J37/147 ,  H01J37/20

Abstract: An improved method and system for correcting inspection image error are disclosed. An improved method comprises acquiring a set of first beam positions on a test wafer while a wafer stage supporting the test wafer moves at a first velocity; acquiring a set of second beam positions, corresponding to the set of first beam positions, on the test wafer while the wafer stage moves at a second velocity; calculating a beam position displacement of a beam while the wafer stage moves at a third velocity in a range of velocities from the first velocity to the second velocity; and adjusting a beam position of the beam based on the calculated beam position displacement.

公开(公告)号：US20220415678A1

公开(公告)日：2022-12-29

申请号：US17811047

申请日：2022-07-06

Applicant: ASML Netherlands B.V.

Inventor： Jeroen Gerard GOSEN ,  Te-Yu CHEN ,  Dennis Herman, Caspar VAN BANNING ,  Edwin Cornelis KADIJK ,  Martijn Petrus, Christianus VAN HEUMEN ,  Erheng WANG ,  Johannes Andreas, Henricus, Maria JACOBS

IPC: H01L21/67 ,  G03F7/20

Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.

公开(公告)号：US20250132122A1

公开(公告)日：2025-04-24

申请号：US18990157

申请日：2024-12-20

Applicant: ASML Netherlands B.V.

Inventor： Thomas Izaak Fred HAARTSEN ,  Niels Johannes Maria BOSCH ,  Jasper Hendrik GRASMAN ,  Martin Frans Pierre SMEETS ,  Erwin SLOT ,  Wouter Onno PRIL ,  Peter Paul HEMPENIUS ,  Te-Yu CHEN

IPC: H01J37/21 ,  G01B7/02 ,  H01J37/20

Abstract: The present disclosure relates to apparatus and methods for assessing samples using a plurality of charged particle beams. In one arrangement, at least a subset of a beam grid of a plurality of charged particle beams and respective target portions of a sample surface are scanned relative to each other to process the target portions. Signal charged particles from the sample are detected to generate detection signals. A sample surface topographical map is generated that represents a topography of the sample surface by analyzing the detection signals.

公开(公告)号：US20240258138A1

公开(公告)日：2024-08-01

申请号：US18423199

申请日：2024-01-25

Applicant: ASML Netherlands B.V.

Inventor： Jeroen Gerard GOSEN ,  Te-Yu CHEN ,  Dennis Herman, Caspar VAN BANNING ,  Edwin Cornelis KADIJK ,  Martijn Petrus, Christianus VAN HEUMEN ,  Erheng WANG ,  Johannes Andreas, Henricus, Maria JACOBS

IPC: H01L21/67 ,  G03F7/00

CPC classification number: H01L21/67201 ,  G03F7/70841 ,  G03F7/70858 ,  H01L21/67098

Abstract: An improved particle beam inspection apparatus, and more particularly, a particle beam inspection apparatus including an improved load lock unit is disclosed. An improved load lock system may comprise a plurality of supporting structures configured to support a wafer and a conditioning plate including a heat transfer element configured to adjust a temperature of the wafer. The load lock system may further comprise a gas vent configured to provide a gas between the conditioning plate and the wafer and a controller configured to assist with the control of the heat transfer element.

公开(公告)号：US20230116381A1

公开(公告)日：2023-04-13

申请号：US17911121

申请日：2021-03-09

Applicant: ASML Netherlands B.V.

Inventor： Long MA ,  Zhonghua DONG ,  Te-Yu CHEN

IPC: H01J37/20 ,  H01J37/28 ,  H01J37/147

Abstract: Apparatuses, systems, and methods for generating a beam for inspecting a wafer positioned on a stage in a charged particle beam system are disclosed. In some embodiments, a controller may include circuitry configured to classify a plurality of regions along a stripe of the wafer by type of region, the stripe being larger than a field of view of the beam, wherein the classification of the plurality of regions includes a first type of region and a second type of region; and scan the wafer by controlling a speed of the stage based on the type of region, wherein the first type of region is scanned at a first speed and the second type of region is scanned at a second speed.

公开(公告)号：US20230086984A1

公开(公告)日：2023-03-23

申请号：US17909352

申请日：2021-02-24

Applicant: ASML Netherlands B.V.

Inventor： Te-Yu CHEN ,  Martinus Gerardus Johannes Maria MAASSEN

IPC: H01J37/28 ,  H01J37/29

Abstract: Apparatuses, systems, and methods for beam array geometry optimization of a multi-beam inspection tool are disclosed. In some embodiments, a microelectromechanical system (MEMS) may include a first row of apertures; a second row of apertures positioned below the first row of apertures; a third row of apertures positioned below the second row of apertures; and a fourth row of apertures positioned below the third row of apertures; wherein the first, second, third, and fourth rows are parallel to each other in a first direction; the first and third rows are offset from the second and fourth rows in a second direction that is perpendicular to the first direction; the first and third rows have a first length; the second and fourth rows have a second length; and the first length is longer than the second length in the second direction.