METHODS OF TUNING A MODEL FOR A LITHOGRAPHIC PROCESS AND ASSOCIATED APPARATUSES

    公开(公告)号:US20230084130A1

    公开(公告)日:2023-03-16

    申请号:US17795058

    申请日:2021-01-11

    Abstract: A method at tuning a lithographic process for a particular patterning device. The method includes: obtaining wavefront data relating to an objective lens of a lithographic apparatus, the wavefront data measured subsequent to an exposure of a pattern on a substrate using the particular patterning device; determining a pattern specific wavefront contribution from the wavefront data and a wavefront reference, the pattern specific wavefront contribution relating to the patterning device; and tuning the lithographic process for the particular patterning device using the pattern specific wavefront contribution.

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