公开(公告)号：US20220413391A1

公开(公告)日：2022-12-29

申请号：US17777348

申请日：2020-10-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Michel Alphons Theodorus VAN HINSBERG ,  James Robert DOWNES ,  Erwin Josef Maria VERDURMEN ,  Jacob Fredrik Friso KLINKHAMER ,  Roy WERKMAN ,  Jochem Sebastiaan WILDENBERG ,  Adam Jan URBANCZYK ,  Lucas Jan Joppe VISSER

IPC: G03F7/20

Abstract: A method for determining an input to a lens model to determine a setpoint for manipulation of a lens of a lithographic apparatus when addressing at least one of a plurality of fields of a substrate, the method including: receiving parameter data for the at least one field, the parameter data relating to one or more parameters of the substrate within the at least one field, the one or more parameters being at least partially sensitive to manipulation of the lens as part of an exposure performed by the lithographic apparatus; receiving lens model data relating to the lens; and determining the input based on the parameter data and on the lens model data.

公开(公告)号：US20190079420A1

公开(公告)日：2019-03-14

申请号：US16084596

申请日：2017-01-26

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Bearrach MOEST ,  Lowell Lane BAKER ,  James Robert DOWNES ,  Wijnand HOITINGA ,  Hermen Folken PEN

IPC: G03F7/20

Abstract: An apparatus including an illumination system to condition a radiation beam, a support to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, a substrate table constructed to hold a substrate, a projection system to project the patterned radiation beam onto a target portion of the substrate, and a control system configured to: receive pattern data characterizing a pattern distribution, receive radiation data characterizing the radiation beam, determine a dissipation distribution of the pattern based on the pattern data and the radiation data, determine deformation of the pattern by applying the dissipation distribution in a thermo-mechanical model of the patterning device, and determine a control signal to control a component of the apparatus based on the deformation of the pattern.

公开(公告)号：US20210011389A1

公开(公告)日：2021-01-14

申请号：US16955324

申请日：2018-12-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Przemyslaw Aleksander KLOSIEWICZ ,  Bogathi Vishnu Vardhana REDDY ,  Syed Umar Hassan RIZVI ,  James Robert DOWNES

IPC: G03F7/20

Abstract: A method of determining a configuration of a projection system for a lithographic apparatus as an implementation of a quadratic programming problem with a penalty function. The method includes: receiving dependencies of one or more optical properties of the projection system on a configuration of a plurality of manipulators of the projection system; receiving a plurality of constraints which correspond to physical constraints of the manipulators; finding an initial configuration of the manipulators; and iteratively finding an output configuration of the manipulators. The iteration includes repeating the following steps: determining a set of the plurality of constraints that are violated; determining an updated configuration of the manipulators, the updated configuration of the manipulators being dependent on the set of the plurality of constraints that are violated and a penalty strength; and increasing the penalty strength. These steps are repeated until a convergence criterion is met.

公开(公告)号：US20170261863A1

公开(公告)日：2017-09-14

申请号：US15527264

申请日：2015-11-02

Applicant: ASML NETHERLANDS B.V.

Inventor： James Robert DOWNES ,  Johannes Jacobus Matheus BASELMANS

IPC: G03F7/20

CPC classification number: G03F7/70425 ,  G03F7/20 ,  G03F7/70491 ,  G03F7/706

Abstract: A method of correcting aberrations caused by a projection system of a lithographic apparatus, the method including performing a measurement of an aberration caused by the projection system using a sensor located in the lithographic apparatus, determining, based on a history of operation of the lithographic apparatus since a change of machine state, whether to average the measured aberration with one or more aberration measurements previously obtained using the sensor, calculating a correction to be applied to the lithographic apparatus using the measured aberration if it is determined that averaging should not be performed, calculating a correction to be applied to the lithographic apparatus using an averaged aberration measurement if it is determined that averaging should be performed, and applying the calculated correction to the lithographic apparatus.

公开(公告)号：US20210033979A1

公开(公告)日：2021-02-04

申请号：US16969078

申请日：2019-01-28

Applicant: ASML Netherlands B.V.

Inventor： Martijn Cornelis SCHAAFSMA ,  Mhamed AKHSSAY ,  James Robert DOWNES

IPC: G03F7/20

Abstract: A method of calibrating a projection system heating model to predict an aberration in a projection system in a lithographic apparatus, the method comprising passing exposure radiation through a projection system to expose one or more exposure fields on a substrate provided on a substrate table, making measurements of the aberration in the projection system caused by the exposure radiation, wherein the time period between measurements is less than the time period that would be taken to expose all exposure fields on the substrate.

公开(公告)号：US20200272059A1

公开(公告)日：2020-08-27

申请号：US16644135

申请日：2018-08-14

Applicant: ASML Netherlands B.V.

Inventor： Pierluigi FRISCO ,  Giovanni IMPONENTE ,  James Robert DOWNES

IPC: G03F7/20

Abstract: A method comprising determining aberrations caused by each lithographic apparatus of a set of lithographic apparatuses, calculating adjustments of the lithographic apparatuses which minimize differences between the aberrations caused by each of the lithographic apparatuses, and applying the adjustments to the lithographic apparatuses, providing better matching between the aberrations of patterns projected by the lithographic apparatuses.

公开(公告)号：US20180088467A1

公开(公告)日：2018-03-29

申请号：US15567191

申请日：2016-04-18

Applicant: ASML Netherlands B.V.

Inventor： Johannes Jacobus Matheus BASELMANS ,  Pieter Bart Aloïs DE BUCK ,  Nico VANROOSE ,  Giovanni IMPONENTE ,  Roland Johannes Wilhelmus STAS ,  Chanpreet KAUR ,  James Robert DOWNES

IPC: G03F7/20 ,  G01M11/02

CPC classification number: G03F7/706 ,  G01M11/0242 ,  G01M11/0257 ,  G03F7/70866

Abstract: A method comprising illuminating a patterning device (MA′) comprising a plurality of patterned regions (15a-15c) of which each patterns a measurement beam (17a-17c), projecting, with a projection system (PL), the measurement beams onto a sensor apparatus (21) comprising a plurality of detector regions (25a-25c), making a first measurement of radiation when the patterning device and the sensor apparatus are positioned in a first relative configuration, moving at least one of the patterning device and the sensor apparatus so as to change the relative configuration of the patterning device to a second relative configuration, making a second measurement of radiation when the patterning device and the sensor apparatus are positioned in the second relative configuration in which at least some of the plurality of detector regions receive a different measurement beam to the measurement beam which was received at the respective detector region in the first relative configuration and determining aberrations caused by the projection system.