公开(公告)号：US11482399B2

公开(公告)日：2022-10-25

申请号：US16652352

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Jian Zhang ,  Qing Jiu Chen ,  Yixiang Wang

IPC: H01J37/22 ,  G01N21/95 ,  G01N21/956 ,  G02B27/09

Abstract: A system and method for advanced charge control of a light beam is provided. The system comprising a laser source comprising a laser diode for emitting a beam and a beam homogenizer to homogenize the emitted beam. The system and methods further comprise a beam shaper configured to shape the emitted beam using an anamorphic prism group and a driver configured to direct the shaped beam to a specified position on a wafer, wherein the laser source, the beam shaper, and the driver are coaxially aligned.