公开(公告)号：US20230417628A1

公开(公告)日：2023-12-28

申请号：US18035895

申请日：2021-10-05

Applicant: ASML Netherlands B.V.

Inventor： Achim WOESSNER ,  Roberto PAGANO ,  Mark-Jan SPIJKMAN

IPC: G01M11/02 ,  G03F7/00

CPC classification number: G01M11/0271 ,  G03F7/706849 ,  G03F7/706

Abstract: A measurement system (11), the measurement system comprising: a sensor apparatus (22); an illumination system (IL1) arranged to illuminate the sensor apparatus with radiation, the sensor apparatus comprising a patterned region arranged to receive a radiation beam and to form a plurality of diffraction beams, the diffraction beams being separated in a shearing direction; the sensor apparatus comprising a radiation detector (24); wherein the patterned region is arranged such that at least some of the diffraction beams form interference patterns on the radiation detector; wherein the sensor apparatus comprises a plurality of patterned regions (19a-19c, 20a, 20b), and wherein pitches of the patterned regions are different in adjacent patterned regions.