公开(公告)号：US20200373118A1

公开(公告)日：2020-11-26

申请号：US16992058

申请日：2020-08-12

Applicant: ASML Netherlands B.V.

Inventor： Marcel Koenraad Marie BAGGEN ,  Peter Paul HEMPENIUS ,  Maarten Frans Janus KREMERS ,  Robertus Jacobus Theodorus VAN KEMPEN ,  Sven Antoin Johan HOL ,  Henricus Martinus Johannes VAN DE GROES ,  Johannes Hubertus Antonius VAN DE RIJDT ,  Niels Johannes Maria BOSCH ,  Maarten Hartger KIMMAN

IPC: H01J37/20 ,  H01L21/66 ,  H01J37/28

Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.