公开(公告)号：US20240288389A1

公开(公告)日：2024-08-29

申请号：US18660165

申请日：2024-05-09

Applicant: ASML NETHERLANDS B.V.

Inventor： Marco Jan-Jaco WIELAND ,  Erwin SLOT ,  Peter Paul HEMPENIUS ,  Niels Johannes Maria BOSCH

IPC: G01N23/2202 ,  B08B5/00 ,  B08B7/00 ,  G01N23/2251

CPC classification number: G01N23/2202 ,  B08B5/00 ,  B08B7/0035 ,  G01N23/2251 ,  G01N2223/6116 ,  G01N2223/646

Abstract: The embodiments of the present disclosure provide a charged particle assessment system for projecting a beam of charged particles towards a sample. The system comprises a sample holder configured to hold a sample; a charged particle optical system configured to project a beam of charged particles from a charged particle source downbeam towards the sample and comprising a cleaning target; and a cleaning device. The cleaning device is configured to supply cleaning medium in a cleaning flow towards the cleaning target incident on the cleaning target so that the cleaning flow approaches the cleaning target from downbeam of the cleaning target, and to stimulate the cleaning medium at or near the cleaning target such that the cleaning medium cleans at least a portion of the surface of the cleaning target.

公开(公告)号：US20220084781A1

公开(公告)日：2022-03-17

申请号：US17535453

申请日：2021-11-24

Applicant: ASML Netherlands B.V.

Inventor： Mark Henricus Wilhelmus VAN GERVEN ,  Johannes Hubertus Antonius VAN DE RIJDT ,  Michaël Johannes Christiaan RONDE ,  Niels Johannes Maria BOSCH

IPC: H01J37/26 ,  H01J37/28

Abstract: Systems directed to a stage apparatus in an electron beam inspection tool to inspect a sample are disclosed. The stage apparatus comprises a short stroke stage; a long stroke stage; a first sensor configured to measure a position of the short stroke stage with respect to a measurement reference; one or more roller bearings configured to support the long stroke stage; and a controller having circuitry and configured to control a motion of the long stroke stage and a motion of the short stroke stage for following movement of the reference at least partly based on measurement from the first sensor, wherein the controller is operable such that control of the long stroke stage is decoupled from the movement of the reference in at least a part of operation of the stage apparatus for reducing debris generation of the one or more roller bearings.

公开(公告)号：US20240312756A1

公开(公告)日：2024-09-19

申请号：US18674282

申请日：2024-05-24

Applicant: ASML Netherlands B.V.

Inventor： Jasper Hendrik GRASMAN ,  Niels Johannes Maria BOSCH ,  Patrick Peter Hubert Helena PHILIPS ,  Peter Paul HEMPENIUS ,  Joan SANS MERCADER ,  Gerardus Wilhelmus SARS ,  Hans BUTLER ,  Willem Henk URBANUS

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J2237/20235

Abstract: Disclosed herein is a platform for a charged particle apparatus, the platform comprising: a base frame; a chamber arranged to comprise a substrate; a metrology frame arranged to support a charged particle beam generator for irradiating a substrate in the chamber with a charged particle beam; and a bellow arranged between the metrology frame and the chamber; wherein: the chamber is rigidly connected to the base frame; the bellow comprises a flexible material such that the metrology frame is substantially isolated from any vibrations that are generated in the chamber; and the bellow is air tight so that a substantial vacuum may be established in the chamber.

公开(公告)号：US20240071713A1

公开(公告)日：2024-02-29

申请号：US18270707

申请日：2021-12-09

Applicant: ASML Netherlands B.V.

Inventor： Niels Johannes Maria BOSCH ,  Xu WANG ,  Peter Paul HEMPENIUS ,  Yongqiang WANG ,  Hans BUTLER ,  Youjin WANG ,  Jasper Hendrik GRASMAN ,  Jianzi SUI ,  Tianming CHEN ,  Aimin WU

IPC: H01J37/20

CPC classification number: H01J37/20 ,  H01J37/28 ,  H01J2237/20235

Abstract: There is provided a charged particle apparatus comprising: a particle beam generator, optics, a first and a second positioning device, both configured for positioning the substrate relative to the particle beam generator along its optical axis, and a controller configured for switching between a first operational mode and a second operational mode. The apparatus is configured, when operating in the first operational mode, for irradiating the substrate by the particle beam at a first landing energy of the particle beam and, when operating in the second operational mode, for irradiating the substrate at a second, different landing energy. When operating in the first operational mode, the second positioning device is configured to position the substrate relative to the particle beam generator at a first focus position of the particle beam and in the second operational mode, to position the substrate at a second, different focus position.

公开(公告)号：US20200373118A1

公开(公告)日：2020-11-26

申请号：US16992058

申请日：2020-08-12

Applicant: ASML Netherlands B.V.

Inventor： Marcel Koenraad Marie BAGGEN ,  Peter Paul HEMPENIUS ,  Maarten Frans Janus KREMERS ,  Robertus Jacobus Theodorus VAN KEMPEN ,  Sven Antoin Johan HOL ,  Henricus Martinus Johannes VAN DE GROES ,  Johannes Hubertus Antonius VAN DE RIJDT ,  Niels Johannes Maria BOSCH ,  Maarten Hartger KIMMAN

IPC: H01J37/20 ,  H01L21/66 ,  H01J37/28

Abstract: An electron beam apparatus is provided. The apparatus comprises an e-beam source configured to generate an electron beam, a first part configured to support a substrate, the first part comprising an object table for supporting the substrate, the first part further comprising a short stroke actuator system for actuating the object table relative to the e-beam source, the short stroke actuator system comprising a short stroke forcer. The apparatus further comprises a second part configured to movably support the first part and a long stroke actuator system configured to actuate movement of the first part with respect to the second part, the long stroke actuator system comprising a long stroke forcer, wherein the short stroke forcer and/or the long stroke forcer is configured to be switched off while the electron beam is projected onto the substrate.