公开(公告)号：US20240288783A1

公开(公告)日：2024-08-29

申请号：US18570242

申请日：2022-05-27

Applicant: ASML Netherlands B.V.

Inventor： Marcus Adrianus VAN DE KERKHOF ,  Victor Antonio PEREZ-FALCON

IPC: G03F7/00

CPC classification number: G03F7/70875 ,  G03F7/70358

Abstract: Systems, apparatuses, and methods are provided for removing heat from a reticle. An example method can include generating, by a cooling controller, a cooling control signal based on timing data for a projection of a patterned radiation beam formed by illuminating an exposed area on a reticle supported by a reticle table, absorption data for the exposed area, and a target heat transfer rate. The cooling control signal can instruct a reticle cooling apparatus to actuate actuators to modify a distance between the reticle and a roof of the reticle cooling apparatus. The method can further include modifying, by the actuators based on the cooling control signal, the distance between the reticle and the roof to modify a heat transfer rate associated with a removal of heat from the reticle towards the target heat transfer rate.

公开(公告)号：US20230008474A1

公开(公告)日：2023-01-12

申请号：US17773004

申请日：2020-10-05

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Victor Antonio PEREZ-FALCON ,  Marcus Adrianus VAN DE KERKHOF ,  Daniel Leslie HALL ,  Christopher John MASON ,  Arthur Winfried Eduardus MINNAERT ,  Johannes Hubertus Josephina MOORS ,  Samir A. NAYFEH

IPC: H02N13/00 ,  G03F7/20

Abstract: Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.

公开(公告)号：US20210041795A1

公开(公告)日：2021-02-11

申请号：US16967794

申请日：2019-02-04

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V,

Inventor： Richard Joseph BRULS ,  Ronald Peter ALBRIGHT ,  Peter Conrad KOCHERSPERGER ,  Victor Antonio PEREZ-FALCON

IPC: G03F7/20 ,  B08B6/00

Abstract: Methods and systems are described for reducing particles in the vicinity of an electrostatic chuck (300) in which a cleaning reticle or substrate (320) is secured to the chuck, the cleaning reticle or substrate having surfaces partially devoid of conductive material so that an electric field from the chuck can pass through to a volume adjacent the substrate to draw particles (360) in the volume to the surface of the substrate. Voltage supplied to the chuck may have an alternating polarity to enhance the attraction of particles to the surface.