公开(公告)号：US11152191B2

公开(公告)日：2021-10-19

申请号：US16729177

申请日：2019-12-27

Applicant: ASML Netherlands B.V.

Inventor： Weihua Yin ,  Youfei Jiang

IPC: H01J37/12 ,  H01J37/26 ,  H01J37/147

Abstract: A charged particle system may include a first charged particle beam source provided on a first axis, and a second charged particle beam source provided on a second axis. There may also be provided a deflector arranged on the first axis. The deflector may be configured to deflect a beam generated from the second charged particle beam source toward a sample. A method of operating a charged particle beam system may include switching between a first state and a second state of operating a deflector. In the first state, a first charged particle beam generated from a first charged particle beam source may be blanked and a second charged particle beam generated from a second charged particle beam source may be directed toward a sample. In the second state, the second charged particle beam may be blanked and the first charged particle beam may be directed toward the sample.

公开(公告)号：US12165837B2

公开(公告)日：2024-12-10

申请号：US17901767

申请日：2022-09-01

Applicant: ASML Netherlands B.V.

Inventor： Martinus Gerardus Maria Johannes Maassen ,  Joost Jeroen Ottens ,  Long Ma ,  Youfei Jiang ,  Weihua Yin ,  Wei-Te Li ,  Xuedong Liu

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/22 ,  H01J37/28

Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein N is an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.

公开(公告)号：US11469076B2

公开(公告)日：2022-10-11

申请号：US17251724

申请日：2019-06-07

Applicant: ASML Netherlands B.V.

Inventor： Martinus Gerardus Maria Johannes Massen ,  Joost Jeroen Ottens ,  Long Ma ,  Youfei Jiang ,  Weihua Yin ,  Wei-Te Li ,  Xuedong Liu

IPC: H01J37/26 ,  H01J37/147 ,  H01J37/22 ,  H01J37/28

Abstract: An improved system and method for inspection of a sample using a particle beam inspection apparatus, and more particularly, to systems and methods of scanning a sample with a plurality of charged particle beams. An improved method of scanning an area of a sample using N charged particle beams, wherein Nis an integer greater than or equal to two, and wherein the area of the sample comprises a plurality of scan sections of N consecutive scan lines, includes moving the sample in a first direction. The method also includes scanning, with a first charged particle beam of the N charged particle beams, first scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the first charged particle beam. The method further includes scanning, with a second charged particle beam of the N charged particle beams, second scan lines of at least some scan sections of the plurality of scan sections moving towards a probe spot of the second charged particle beam.