-
1.
公开(公告)号:US20230162944A1
公开(公告)日:2023-05-25
申请号:US17916785
申请日:2021-03-31
Applicant: ASML Netherlands B.V.
Inventor: Xiang WANG , Steffen MEYER , Mark O'MAHONY
CPC classification number: H01J37/222 , H01J37/28 , H01J2237/2817 , H01J2237/2809 , H01J2237/0044 , H01J2237/282
Abstract: An improved method and apparatus for enhancing an inspection image in a charged-particle beam inspection system. An improved method for enhancing an inspection image comprises acquiring a plurality of test images of a sample that are obtained at different landing energies, determining distortion levels for the plurality of test images, determining a landing energy level that enables the sample to be in a neutral charge condition during inspection based on the distortion levels, and acquiring an inspection image based on the determined landing energy level.