公开(公告)号：US20240183806A1

公开(公告)日：2024-06-06

申请号：US18284824

申请日：2022-03-04

Applicant: ASML Netherlands B.V.

Inventor： Te-Sheng WANG ,  Szu-Po WANG ,  Tsung-Hsien LIU ,  Yung-Huan HSIEH

IPC: G01N23/2251

CPC classification number: G01N23/2251 ,  G01N2223/305 ,  G01N2223/6116

Abstract: Apparatuses, systems, and methods for determining local focus points (LFPs) on a sample are provided. In some embodiments, a controller including circuitry may be configured to cause a system to perform selecting a first plurality of resist pattern designs; performing a plurality of process simulations using the first plurality of resist pattern designs; identifying a hotspot that corresponds to a resist pattern design based on results of the performed process simulations; determining focus-related characteristics that correspond to a plurality of candidate resist patterns, wherein the plurality of candidate resist pattern designs is a subset of the first plurality of resist pattern designs and the subset is selected based on the identified hotspot; and determining locations of a plurality of LFPs based on the generated focus-related characteristics.