公开(公告)号：US20130141723A1

公开(公告)日：2013-06-06

申请号：US13667199

申请日：2012-11-02

Applicant: ASML Netherlands N.V.

Inventor： Xiuhong WEI ,  Franciscus Godefridus Casper BIJNEN ,  Richard Johannes Franciscus VAN HAREN ,  Marcus Adrianus VAN DE KERKHOF ,  Everhardus Cornelis MOS ,  Hubertus Johannes Gertrudus SIMONS ,  Remi Daniel Marie EDART ,  David DECKERS ,  Nicole SCHOUMANS ,  Irina LYULINA

IPC: G01B11/14

CPC classification number: G01B11/272 ,  G01B11/27 ,  G03F9/7046 ,  G03F9/7049

Abstract: A method is used to estimate a value representative for a level of alignment mark deformation on a processed substrate using an alignment system. The alignment sensor system is able to emit light at different measuring frequencies to reflect from an alignment mark on the substrate and to detect a diffraction pattern in the reflected light in order to measure an alignment position of the alignment mark. The two or more measuring frequencies are used to measure an alignment position deviation per alignment mark associated with each of the two or more measuring frequencies relative to an expected predetermined alignment position of the alignment mark. A value is determined representative for the spread in the determined alignment position deviations per alignment mark in order to estimate the level of alignment mark deformation.

Abstract translation: 使用方法来估计使用对准系统代表处理的衬底上的对准标记变形水平的值。 对准传感器系统能够发射不同测量频率的光以从基板上的对准标记反射并检测反射光中的衍射图案，以便测量对准标记的对准位置。 两个或更多个测量频率用于测量与相对于对准标记的期望的预定对准位置的两个或多个测量频率中的每一个相关联的对准标记的对准位置偏差。 确定对于每个对准标记确定的对准位置偏差中的扩展的代表性的值，以便估计对准标记变形的水平。