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公开(公告)号：US12025924B2
公开(公告)日：2024-07-02
申请号：US17463769
申请日：2021-09-01
发明人： Shinichi Egashira
CPC分类号： G03F9/7046 , G03F9/7088 , H01L22/20
摘要： Provided is a method of determining, out of a plurality of shot regions of a substrate, a set of sample shot regions in each of which a position of a mark is to be actually measured. The method includes setting an initial arrangement of the set of sample shot regions, and adding, to the set of sample shot regions, a shot region, among the shot regions other than the sample shot regions in the initial arrangement, in which a value indicating uncertainty of an estimate of a measurement value of a position of a mark obtained using an estimation model exceeds a predetermined threshold value.
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公开(公告)号：US20240210844A1
公开(公告)日：2024-06-27
申请号：US18596499
申请日：2024-03-05
CPC分类号： G03F9/7092 , G03F7/70508 , G03F9/7046 , G03F9/7088
摘要： Disclosed is a method of determining a substrate deformation metric relating to at least one substrate, the substrate deformation metric describing deformation across the at least one substrate. The method comprises obtaining alignment data relating to measurement of a plurality of structures on said substrate using a plurality of illumination conditions; and determining substrate deformation metric values for the substrate deformation metric which minimizes the number of basis vectors which are required to expand dispersion due to structure deformation of said plurality of structures.
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公开(公告)号：US20240201580A1
公开(公告)日：2024-06-20
申请号：US18082948
申请日：2022-12-16
发明人： Nolan Layne ZIMMERMAN , Banqiu WU
CPC分类号： G03F1/82 , G03F1/66 , G03F9/7046
摘要： An automatic photomask handling assembly is employed for holding a photomask for cleaning processes in an atmospheric pressure plasma (APP) chamber. The automatic photomask handling assembly includes a set of stationary standoffs with each of the stationary standoffs having a first end solidly mounted to the photomask handling assembly and a second end that contacts an underside of a photomask. The automatic photomask handling assembly also has a handling stage that holds the photomask for processing. The handling stage has a set of through openings that allow the set of stationary standoffs to pass through the handling stage as the handling stage moves vertically. The handling stage also has a set of plates that automatically clamp and unclamp a photomask as the handling stage moves vertically. The set of plates completely surrounds the photomask such that the clamped photomask and the set of plates form a continuous surface.
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公开(公告)号：US11960216B2
公开(公告)日：2024-04-16
申请号：US17641212
申请日：2020-08-25
申请人： ASML Holding N.V.
发明人： Lev Ryzhikov , Yuli Vladimirsky
IPC分类号： G03F9/00
CPC分类号： G03F9/7011 , G03F9/7046 , G03F9/7049 , G03F9/7088 , G03F9/7096
摘要： A pre-alignment system includes a common object lens group configured to collect diffracted beams from a patterning device, wherein the common object lens group is further configured to produce telecentricity in an object space of the pre-alignment system. The pre-alignment system also includes a multipath sensory array having at least one image lens system, wherein the at least one image lens system includes a telecentric converter lens configured to produce telecentricity in an image space of the pre-alignment system.
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公开(公告)号：US20240053941A1
公开(公告)日：2024-02-15
申请号：US18492587
申请日：2023-10-23
发明人： Naoki Miyata , Kenta Kita
IPC分类号： G06F3/14 , G06F16/9038 , G06F16/901 , G03F7/00 , G03F9/00 , G06F3/147
CPC分类号： G06F3/14 , G06F16/9038 , G06F16/9024 , G03F7/70491 , G03F7/70633 , G03F9/7046 , G06F3/147
摘要： An information processing apparatus includes a processor and a memory for storing instructions to be executed by the processor, wherein the instructions stored in the memory are executed by the processor to acquire information containing first process data indicating a result of a substrate process in a first recipe and second process data indicating a result of a substrate process in a second recipe different from the first recipe, and control a display on a display apparatus based on the acquired information, and wherein control is performed to display, on the display apparatus, a first screen displaying a first data group in which the first process data is arranged chronologically and a second data group in which the second process data is arranged chronologically, the first screen displaying the first data group in a region and the second data group in another region.
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公开(公告)号：US11854854B2
公开(公告)日：2023-12-26
申请号：US17383849
申请日：2021-07-23
发明人： Chang-Jen Chen , Wen-Yun Wang , Yen-Chun Chen , Po-Ting Yeh
IPC分类号： H01L21/68 , H01L23/544 , G01N21/95 , G03F9/00
CPC分类号： H01L21/681 , G01N21/9501 , G03F9/7023 , G03F9/7046 , G03F9/7049 , G03F9/7088 , G03F9/7092 , H01L23/544
摘要： A method for calibrating the alignment of a wafer is provided. A plurality of alignment position deviation (APD) simulation results are obtained form a plurality of mark profiles. An alignment analysis is performed on a mark region of the wafer with a light beam. A measured APD of the mark region of the wafer is obtained in response to the light beam. The measured APD is compared with the APD simulation results to obtain alignment calibration data. An exposure process is performed on the wafer with a mask according to the alignment calibration data.
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公开(公告)号：US11829676B2
公开(公告)日：2023-11-28
申请号：US17239332
申请日：2021-04-23
发明人： Naoki Miyata , Kenta Kita
IPC分类号： G06F3/14 , G06F16/9038 , G06F16/901 , G03F7/00 , G03F9/00 , G06F3/147
CPC分类号： G06F3/14 , G03F7/70491 , G03F7/70633 , G03F9/7046 , G06F3/147 , G06F16/9024 , G06F16/9038
摘要： An information processing apparatus includes an acquisition unit configured to acquire information containing first process data indicating a result of a substrate process in a first process condition and second process data indicating a result of a substrate process in a second process condition different from the first process condition, and a display control unit configured to control a display on a display apparatus based on the information acquired by the acquisition unit, wherein the display control unit is configured to display, on the display apparatus, a first screen displaying a first data group in which the first process data is arranged chronologically and a second data group in which the second process data is arranged chronologically, the first screen displaying the first data group in a region and the second data group in another region.
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8.发明公开公开(公告)号：US20230359134A1
公开(公告)日：2023-11-09
申请号：US18213294
申请日：2023-06-23
发明人： Shinichi Egashira
CPC分类号： G03F9/7046 , G06T7/70 , G03F9/7076 , G03F9/7088 , G03F9/7092 , H01L21/681 , H01L21/682 , G03F1/42
摘要： The present invention provides a processing system that includes a first apparatus and a second apparatus, and processes a substrate, wherein the first apparatus includes a first measurement unit configured to detect a first structure and a second structure different from the first structure provided on the substrate, and measure a relative position between the first structure and the second structure, and the second apparatus includes an obtainment unit configured to obtain the relative position measured by the first measurement unit, a second measurement unit configured to detect the second structure and measure a position of the second structure, and a control unit configured to obtain a position of the first structure based on the relative position obtained by the obtainment unit and the position of the second structure measured by the second measurement unit.
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公开(公告)号：US20230288823A1
公开(公告)日：2023-09-14
申请号：US18319711
申请日：2023-05-18
发明人： Wataru Yamaguchi
CPC分类号： G03F9/7088 , G03F7/70633 , G03F7/70683 , G03F9/7046 , G03F9/7076 , G03F9/7092 , G06T7/0004 , G06T2207/30148
摘要： The present invention provides a measurement apparatus for measuring a position of a first pattern and a position of a second pattern provided in a target object, the apparatus including an image capturing unit including a plurality of pixels which detect light from the first pattern and light from the second pattern, and configured to form an image capturing region used to capture the first pattern and the second pattern by the plurality of pixels, and a control unit configured to adjust the image capturing unit such that a relative ratio of an intensity of a detection signal of the first pattern generated based on an output from a first image capturing region and an intensity of a detection signal of the second pattern generated based on an output from a second image capturing region falls within an allowable range.
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公开(公告)号：US20230205104A1
公开(公告)日：2023-06-29
申请号：US17561721
申请日：2021-12-24
申请人： Shakul TANDON
发明人： Shakul TANDON
CPC分类号： G03F9/7076 , H01L23/544 , H01J37/222 , G03F9/7046 , G06T7/66 , G06T7/73 , G06T7/0004 , H01L2223/54426 , H01L2223/54433 , G06T2207/30148
摘要： Embodiments described herein may be related to apparatuses, processes, and techniques related to using full stack overlay cell (FSOL) targets within lithography masks and on fabricated layers of a substrate in order to align or to assess the alignment of fabricated layers of the substrate during the substrate manufacturing process. Other embodiments may be described and/or claimed.
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