专利检索 ap:("AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.") AND inv:"Yuki Ozaki" 第 1 页

1.

发明授权
Film-forming composition and film-forming method using same 有权

公开(公告)号：US10513632B2

公开(公告)日：2019-12-24

申请号：US14913821

申请日：2014-09-16

申请人： AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.

发明人： Yuki Ozaki , Noboru Satake , Shunji Kawato , Masakazu Kobayashi

IPC分类号： C09D183/14 , B05D3/04 , B05D3/06 , B05D7/04 , C08J7/04 , C09D183/16 , C08G77/62 , C08G77/26

摘要： [Problem] To provide a film forming composition and a method for preparing a film with which it is possible to form a film having excellent gas barrier performance.[Means for Solution] Disclosed is a film forming composition comprising: a polysiloxane that does not include a hydroxyl group or a carboxyl group; a polysilazane; and an organic solvent. Also disclosed is a method for preparing a film comprising: coating a substrate with said composition; and exposing the same to light.