公开(公告)号：US10513632B2

公开(公告)日：2019-12-24

申请号：US14913821

申请日：2014-09-16

申请人： AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.

发明人： Yuki Ozaki ,  Noboru Satake ,  Shunji Kawato ,  Masakazu Kobayashi

IPC分类号： C09D183/14 ,  B05D3/04 ,  B05D3/06 ,  B05D7/04 ,  C08J7/04 ,  C09D183/16 ,  C08G77/62 ,  C08G77/26

摘要： [Problem] To provide a film forming composition and a method for preparing a film with which it is possible to form a film having excellent gas barrier performance.[Means for Solution] Disclosed is a film forming composition comprising: a polysiloxane that does not include a hydroxyl group or a carboxyl group; a polysilazane; and an organic solvent. Also disclosed is a method for preparing a film comprising: coating a substrate with said composition; and exposing the same to light.

公开(公告)号：US09411232B2

公开(公告)日：2016-08-09

申请号：US14770694

申请日：2014-03-14

申请人： AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.

发明人： Tatsuro Nagahara ,  Takashi Sekito ,  Kazuma Yamamoto ,  Masakazu Kobayashi ,  Noboru Satake ,  Masahiro Ishii

IPC分类号： G03F7/11 ,  G03F7/40 ,  G03F7/09 ,  H01L21/027 ,  H01L21/768 ,  C08L33/14 ,  C09D139/04 ,  G03F7/039 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32

CPC分类号： G03F7/11 ,  C08L33/14 ,  C09D139/04 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/094 ,  G03F7/16 ,  G03F7/168 ,  G03F7/20 ,  G03F7/32 ,  G03F7/40 ,  G03F7/405 ,  H01L21/0274 ,  H01L21/76816

摘要： The present invention provides a composition enabling to form a fine negative photoresist pattern less suffering from surface roughness, and also provides a pattern formation method employing that composition. The composition is used for miniaturizing a resist pattern by fattening in a process of forming a positive resist pattern from a chemically amplified positive-working type resist composition, and it contains a polymer comprising a repeating unit having an amino group, a solvent, and an acid. In the pattern formation method, the composition is cast on a positive photoresist pattern beforehand obtained by development and is then heated to form a fine pattern.

摘要翻译： 本发明提供能够形成较少受到表面粗糙度的微细负性光致抗蚀剂图案的组合物，并且还提供了使用该组成的图案形成方法。 该组合物用于在从化学放大正性抗蚀剂组合物形成正性抗蚀剂图案的过程中通过育肥来使抗蚀剂图案小型化，并且其包含含有具有氨基的重复单元，溶剂和 酸。 在图案形成方法中，将组合物浇铸在通过显影预先获得的正性光致抗蚀剂图案上，然后加热以形成精细图案。