公开(公告)号：US20190033717A1

公开(公告)日：2019-01-31

申请号：US15773029

申请日：2016-11-02

申请人： AZ Electronic Materials (Luxembourg) S.a.r.l.

发明人： Masato SUZUKI ,  Hiroshi HITOKAWA ,  Tomohide KATAYAMA

IPC分类号： G03F7/038 ,  G03F7/004 ,  G03F7/40

摘要： [Problem] To provide a high heat resistance resist composition and a pattern formation method using the composition. [Solution] The present invention provides a chemically amplified negative-type resist composition comprising a particular polymer and a particular crosslinking agent, and this composition makes it possible to form a resist pattern of high sensitivity, of excellent resolution and of strong heat-resistance.

公开(公告)号：US20190171107A1

公开(公告)日：2019-06-06

申请号：US16324299

申请日：2017-08-02

申请人： AZ Electronic Materials (Luxembourg) S.a.r.l.

发明人： Hiroshi HITOKAWA ,  Tetsumasa TAKAICHI ,  Shunji KAWATO ,  Tomohide KATAYAMA

IPC分类号： G03F7/09 ,  C09D133/14 ,  C09D125/18

摘要： [Problem to be Solved] To provide a bottom antireflective coating forming composition which can show high etching resistance and can be crosslinked even at a relatively low temperature. Further, to provide a resist pattern manufacturing method and a device manufacturing method using the same. [Solution] The bottom antireflective coating forming composition comprises: a polymer A comprising specific repeating units; a low molecular crosslinking agent having a molecular weight of 1 00 to 3,000; and a solvent. The resist pattern manufacturing method and the device manufacturing method using the same are also provided.

公开(公告)号：US20170190586A1

公开(公告)日：2017-07-06

申请号：US15315616

申请日：2015-05-28

申请人： AZ Electronic Materials (Luxembourg) S.a.r.l.

发明人： HIROSHI YANAGITA ,  Shigemasa NAKASUGI ,  Hiroshi HITOKAWA ,  Tomohide KATAYAMA ,  Katsuyuki SAKAMOTO

IPC分类号： C01B33/18 ,  C01B33/145 ,  C09C1/30 ,  C09C3/12

CPC分类号： C01B33/18 ,  C01B33/145 ,  C01B33/146 ,  C01P2004/64 ,  C09C1/30 ,  C09C1/3081 ,  C09C3/12

摘要： [Problem]To provide a dispersion containing surface-modified silica nanoparticles highly dispersed in an organic dispersion medium and also having high transparency and storage stability.[Solution]Disclosed is a method for producing surface-modified silica nanoparticles comprising: preparing a first silica nanoparticle dispersion containing silica nanoparticles and an aqueous dispersion medium; replacing the aqueous dispersion medium in the first silica nanoparticle dispersion with an organic dispersion medium comprising at least one selected from cyclic esters or cyclic amides, to obtain a second silica nanoparticle dispersion; and mixing the second silica nanoparticle dispersion with a silane coupling agent represented by the formula (1): (each R1 is independently a hydrocarbon group of C1 to C20 and R2 is a hydrocarbon group of C1 to C3), to modify the surface of the silica nanoparticles.