公开(公告)号：US20220356363A1

公开(公告)日：2022-11-10

申请号：US17629131

申请日：2020-07-23

Applicant: Adaptive 3D Technologies, LLC

Inventor： Benjamin R. Lund ,  Jesse HUFFSTETLER

IPC: C09D11/101 ,  C09D11/107 ,  C09D11/037 ,  B33Y70/00

Abstract: The present disclosure relates to thiol-acrylate photopolymerizable resin compositions. The resin compositions may be used for additive manufacturing. One embodiment of the invention includes a photopolymerizable resin for additive manufacturing, the resin comprising: an acrylate oligomer; a methacrylate monomer; and a thiol wherein the resin may be configured to react by exposure to light to form a cured material. The resin may further comprise one or more oligomeric additives. For example, polyether oligomeric additives such as polytetrahydrofuran.