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公开(公告)号:US06699745B1
公开(公告)日:2004-03-02
申请号:US09049591
申请日:1998-03-27
申请人: Aditi Banerjee , Rick L. Wise , Darius L. Crenshaw
发明人: Aditi Banerjee , Rick L. Wise , Darius L. Crenshaw
IPC分类号: H01L218234
CPC分类号: H01L27/10852 , H01L27/10817 , H01L28/84 , Y10S438/964
摘要: A rugged polysilicon electrode for a capacitor has high surface area enhancement with a thin layer by high nucleation density plus gas phase doping which also enhances grain shape and oxygen-free dielectric formation.