公开(公告)号：US20140051199A1

公开(公告)日：2014-02-20

申请号：US13993757

申请日：2011-12-09

申请人： Adolf Muenzer ,  Andreas Teppe ,  Jan Schoene ,  Mathias Hein ,  Jens Kruemberg ,  Sandra Kruemberg

发明人： Adolf Muenzer ,  Andreas Teppe ,  Jan Schoene ,  Mathias Hein ,  Jens Kruemberg ,  Sandra Kruemberg

IPC分类号： H01L31/0236

CPC分类号： H01L31/0236 ,  H01L31/02363 ,  H01L31/056 ,  Y02E10/52

摘要： Method for producing a silicon solar cell which is smoothly etched on one side, in which a front side and a rear side of a silicon substrate are etched (10) to form a smooth texture, a dielectric coating is then formed (14, 16) on the rear side of the silicon substrate and the front side of the silicon substrate is subsequently textured (20) by means of a texture etching medium, the dielectric coating formed on the rear side of the silicon substrate being used as an etching mask against the texture etching medium.

摘要翻译： 制造在硅衬底的前侧和后侧蚀刻（10）以形成光滑纹理的一侧平滑蚀刻的硅太阳能电池的方法，然后形成电介质涂层（14,16） 在硅衬底的后侧，随后通过纹理蚀刻介质对硅衬底的前侧进行纹理化（20），形成在硅衬底的后侧上的电介质涂层用作抗蚀剂掩模 纹理蚀刻介质。