公开(公告)号：US20190143454A1

公开(公告)日：2019-05-16

申请号：US16182911

申请日：2018-11-07

Applicant: Advanced Technology Inc.

Inventor： Byoung-Chan CHOI ,  Yong Cheol CHOI ,  Ho Kyeng CHOI ,  Young Hun SONG ,  Ki Won JUNG ,  Doo Baeck AN

IPC: B23K26/352 ,  B23K26/00 ,  B23K26/03 ,  B23K26/042 ,  B23K26/06 ,  B23K26/0622 ,  B23K26/082

Abstract: A laser patterning apparatus of a three-dimensional object to be processed, which includes a laser generation unit, a first beam adjustment unit for adjusting the magnitude of a laser beam generated in the laser generation unit, a second beam adjustment unit for adjusting the focal location of z-axis, x-axis, and y-axis of the laser beam via the first beam adjustment unit, and a control unit for controlling the second beam adjustment unit so that laser patterning is performed on a three-dimensional object to be processed.