公开(公告)号：US20050059311A1

公开(公告)日：2005-03-17

申请号：US10871431

申请日：2004-06-18

Applicant: Alan Ellis

Inventor： Alan Ellis

IPC: C09K11/65 ,  H01J1/304 ,  H01J1/63 ,  H01J1/70 ,  H01J31/12 ,  H01J9/00 ,  H01J9/24

CPC classification number: B82Y20/00 ,  C09K11/06 ,  C09K11/65 ,  H01J1/3044 ,  H01J1/3048 ,  H01J1/63 ,  H01J1/70 ,  H01J31/12

Abstract: A method of constructing a flexible panel display using gold as a conductive element and a matrix of carbon fibers as emitters is presented. The invention provides a novel defined pixel width of three emitter fibers per cell wherein each cell is positioned within three emulsion layers of suspended nano-crystals stack positioned vertically atop one-another. Each of these respective layers is excited by a single carbon fiber. In the preferred embodiment, fiber length ends from each cell are positioned at the mid-point of each respective polymer layer thickness and produce one of red, green, or blue colors required to complete the image formation.

公开(公告)号：US20100200393A1

公开(公告)日：2010-08-12

申请号：US12703113

申请日：2010-02-09

Applicant: Robert Chow ,  Alan Ellis

Inventor： Robert Chow ,  Alan Ellis

IPC: C23C14/35 ,  C23C14/34

CPC classification number: C23C14/0042 ,  C23C14/083 ,  C23C14/548

Abstract: A sputter deposition method and system for producing a metal oxide film, especially a dielectric standoff layer of a thin film/nanolayer capacitor. A noble gas, such as argon, is used to sputter metal ions from a metal target, such as niobium, in the presence of a partial pressure of oxygen in a vacuum chamber. And an oxygen-to-noble gas flow ratio entering the vacuum chamber is controlled by a flow controller to be within an operating range defined between a predetermined lower limit (such as 30% O2/Ar for niobium oxide) associated with a minimum transparency/stoichiometric threshold and a predetermined upper limit (such as 80% O2/Ar for niobium oxide) associated with a maximum roughness/porosity threshold, so that a reaction between the sputtered metal ions and the oxygen produces a substantially transparent metal oxide film with a substantially smooth non-porous surface.

Abstract translation: 用于制造金属氧化物膜，特别是薄膜/纳米层电容器的介电隔离层的溅射沉积方法和系统。 在真空室中存在氧分压的情况下，使用诸如氩的惰性气体从金属靶（例如铌）溅射金属离子。 并且通过流量控制器控制进入真空室的氧气到惰性气体流量比在与最小透明度/最小值相关联的预定下限（例如，氧化铌的30％O 2 / Ar）之间限定的工作范围内， 化学计量阈值和与最大粗糙度/孔隙度阈值相关联的预定上限（例如，氧化铌的80％O 2 / Ar），使得溅射的金属离子和氧之间的反应产生基本上透明的金属氧化物膜， 光滑无孔表面。