Detection and handling of semiconductor wafer and wafer-like objects
    1.
    发明授权
    Detection and handling of semiconductor wafer and wafer-like objects 有权
    检测和处理半导体晶片和晶片状物体

    公开(公告)号:US06631935B1

    公开(公告)日:2003-10-14

    申请号:US09632236

    申请日:2000-08-04

    IPC分类号: B25J1506

    摘要: An end-effector includes multiple vortex chucks for supporting a wafer. Vortex chucks are located along the periphery of the end-effector to help prevent a flexible wafer from curling. The end-effector has limiters to restrict the lateral movement of a supported wafer. In one example, the end-effector has a detector for detecting the presence of a wafer. The detector is mounted at a shallow angle to allow the end-effector to be positioned close to a wafer to be picked-up, thereby allowing detection of deformed wafers contained in a wafer cassette. The shallow angle of the detector also minimizes the thickness of the end-effector. Also disclosed is a wafer station with features similar to that of the end-effector.

    摘要翻译: 末端执行器包括用于支撑晶片的多个涡流卡盘。 涡流卡盘位于末端执行器的周边,以帮助防止柔性晶片卷曲。 末端执行器具有限制器以限制支撑的晶片的横向移动。 在一个示例中,末端执行器具有用于检测晶片存在的检测器。 检测器以较小的角度安装,以使末端执行器靠近晶片定位以便被拾起,从而允许检测包含在晶片盒中的变形的晶片。 检测器的浅角度也使端部执行器的厚度最小化。 还公开了具有与末端执行器相似的特征的晶片站

    Detection and handling of semiconductor wafers and wafers-like objects
    2.
    发明授权
    Detection and handling of semiconductor wafers and wafers-like objects 失效
    半导体晶片和晶片状物体的检测和处理

    公开(公告)号:US07144056B2

    公开(公告)日:2006-12-05

    申请号:US10397906

    申请日:2003-03-25

    IPC分类号: B25J15/06 B25J19/02

    摘要: An end-effector includes multiple vortex chucks for supporting a wafer. Vortex chucks are located along the periphery of the end-effector to help prevent a flexible wafer from curling. The end-effector has limiters to restrict the lateral movement of a supported wafer. In one example, the end-effector has a detector for detecting the presence of a wafer. The detector is mounted at a shallow angle to allow the end-effector to be positioned close to a wafer to be picked-up, thereby allowing detection of deformed wafers contained in a wafer cassette. The shallow angle of the detector also minimizes the thickness of the end-effector. Also disclosed is a wafer station with features similar to that of the end-effector.

    摘要翻译: 末端执行器包括用于支撑晶片的多个涡流卡盘。 涡流卡盘位于末端执行器的周边,以帮助防止柔性晶片卷曲。 末端执行器具有限制器以限制支撑的晶片的横向移动。 在一个示例中,末端执行器具有用于检测晶片存在的检测器。 检测器以较小的角度安装,以使末端执行器靠近晶片定位以便被拾起,从而允许检测包含在晶片盒中的变形的晶片。 检测器的浅角度也使端部执行器的厚度最小化。 还公开了具有与末端执行器类似的特征的晶片台。

    Detection and handling of semiconductor wafers and wafer-like objects
    6.
    发明授权
    Detection and handling of semiconductor wafers and wafer-like objects 有权
    半导体晶片和晶片状物体的检测和处理

    公开(公告)号:US07104579B2

    公开(公告)日:2006-09-12

    申请号:US10756631

    申请日:2004-01-12

    IPC分类号: B25J15/06 B25J19/02

    摘要: An end effector has one or more vortex chucks to support a wafer, and at least two detectors for detecting different portions of the wafer before the wafer is picked up. If one of the detectors detects a wafer and the other one does not, an alarm is generated to alert an operator that the wafer is possibly cross slotted in the wafer cassette. Each detector includes a light emitter and a light receiver. The light emitter emits a light beam at an angle to a surface defined by an ideally flat wafer when the wafer is supported by the end effector (the actual wafers do not have to be flat). The angle is not more than 45°, and is between 6° and 12° in some embodiments. Other features and embodiments are also provided.

    摘要翻译: 端部执行器具有一个或多个涡流卡盘以支撑晶片,以及至少两个检测器,用于在晶片被拾取之前检测晶片的不同部分。 如果其中一个检测器检测到晶片而另一个检测不到,则产生警报以警告操作者晶片可能在晶片盒中交叉开槽。 每个检测器包括光发射器和光接收器。 当晶片由末端执行器支撑时,发光体发射与由理想平坦的晶片限定的表面成一定角度的光束(实际晶片不必是平坦的)。 在一些实施例中,角度不大于45°,并且在6°和12°之间。 还提供了其它特征和实施例。