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公开(公告)号：US12016926B2
公开(公告)日：2024-06-25
申请号：US16772273
申请日：2018-12-07
申请人： BASF SE
发明人： Ferdinand Paul Brandl , Theo Smit , Felicitas Guth , Karl Kolter , Maximilian Angel , Frank Schmidt
IPC分类号： A61K9/16 , A61K31/216 , A61K31/5377 , A61K31/58 , A61K31/635 , A61K47/32 , C08F220/06 , C08F220/18 , C08F226/10
CPC分类号： A61K47/32 , A61K9/1635 , A61K31/216 , A61K31/5377 , A61K31/58 , A61K31/635 , C08F220/06 , C08F220/1803 , C08F220/1804 , C08F220/1806 , C08F226/10 , C08F220/1803 , C08F220/06 , C08F226/10 , C08F220/1806 , C08F220/06 , C08F226/10 , C08F220/1804 , C08F220/06 , C08F220/301
摘要： Terpolymer, wherein 20 to 35% by weight of the structural units are derived from acrylic acid, 45 to 60% by weight of the structural units from a hydrophobic methacrylate selected from a group consisting of isopropyl methacrylate, tert-butyl methacrylate and cyclohexyl methacrylate and 15 to 40% by weight of the structural units from a third olefinic monomer selected from the group consisting of N-vinyl lactam, hydroxy ethyl methacrylate and phenoxyethyl acrylate with the proviso that the total amount of structural units derived from the three monomer groups adds up to 100% by weight, and the use of the terpolymers as crystallization inhibitors in pharmaceutical dosage forms for inhibiting the recrystallization in an aqueous environment of a human or animal body of an active ingredient.
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2.发明公开公开(公告)号：US20230400767A1
公开(公告)日：2023-12-14
申请号：US18239399
申请日：2023-08-29
申请人： JSR CORPORATION
IPC分类号： G03F7/039 , G03F7/038 , G03F7/004 , C08F212/14 , C07C69/54 , C08F220/18 , C08F220/24 , C08F220/22 , C08F220/30 , C08F220/34
CPC分类号： G03F7/039 , G03F7/038 , G03F7/0045 , C08F212/24 , C07C69/54 , C08F220/1805 , C08F220/1806 , C08F220/1807 , C08F220/1808 , C08F220/1809 , C08F220/24 , C08F220/1811 , C08F220/22 , C08F220/301 , C08F220/1812 , C08F220/1818 , C08F220/34
摘要： A radiation-sensitive resin composition includes: a polymer including a first structural unit represented by formula (1); and a radiation-sensitive acid generator. In the formula (1), R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; R2, R3, and R4 each independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; R5 represents a monovalent organic group having 1 to 20 carbon atoms; and L represents a single bond or a divalent organic group having 1 to 20 carbon atoms.
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公开(公告)号：US12030970B2
公开(公告)日：2024-07-09
申请号：US17621282
申请日：2020-06-25
申请人： KURARAY CO., LTD.
发明人： Daiki Noguchi , Takashi Fukumoto , Kenji Suzuki
IPC分类号： C08F2/46 , A61K6/887 , B29C64/106 , C08F2/48 , C08F2/50 , C08F220/30 , C08F220/40 , C08F220/58 , C08F222/10 , C08G18/24 , C08G18/42 , C08G18/75 , C08G61/04 , C08K3/36 , B33Y10/00 , B33Y70/00 , B33Y80/00
CPC分类号： C08F222/1065 , A61K6/887 , B29C64/106 , C08F2/48 , C08F220/301 , C08F220/40 , C08F220/58 , C08G18/242 , C08G18/4238 , C08G18/755 , C08K3/36 , B33Y10/00 , B33Y70/00 , B33Y80/00
摘要： A curable composition contains 79.0 to 99.0% by mass of a polymerizable monomer (a), 0.1 to 10.0% by mass of a photopolymerization initiator (b), and 0.01 to 20.0% by mass of a compound represented by the following general formula (I) as a polyfunctional polymerizable compound (c):
wherein R1 and R2 each independently represent at least one kind selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group; R3 represents at least one kind of a polymerizable functional group selected from the group consisting of a (meth)acryloyl group, a 4-vinylphenyl group, and an alkenyl group having 2 to 5 carbon atoms; and n represents an arbitrary integer of 0 to 5.-
4.发明公开公开(公告)号：US20240052081A1
公开(公告)日：2024-02-15
申请号：US17641847
申请日：2020-09-11
申请人： Arkema France
发明人： Yann STOLZ , Noemi FEILLEE
IPC分类号： C08F226/12 , C08F220/30 , C08F220/18 , C08L71/02
CPC分类号： C08F226/12 , C08F220/301 , C08F220/18 , C08L71/02 , B33Y70/10
摘要： Disclosed are high refractive index monomers for ceramic/metal 3D printing applications. The compositions disclosed herein have a higher refractive index and thus better resolution and lower scattering of the light when employed in a composition to deposit ceramic or metallic particles. The disclosed compositions also include low refractive cross-linkers selected for their good thermal decomposition and reactivity to provide good cohesion during the 3D printing.
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公开(公告)号：US11780947B2
公开(公告)日：2023-10-10
申请号：US16498448
申请日：2018-03-29
发明人： Toshikazu Sakamaki
IPC分类号： C08F222/10 , A61K6/88 , A61K6/887 , A61C13/087 , C08F2/48 , C08F20/30 , C08F220/18
CPC分类号： C08F222/1025 , A61C13/087 , A61K6/887 , C08F2/48 , C08F20/30 , C08F222/1063 , C08F220/1807 , C08F222/1025 , C08F220/301 , C08F222/1063 , C08F220/301 , C08F222/1025 , C08F220/1807 , C08F222/1063 , C08F220/1807
摘要： The present invention provides a photocurable composition for use in stereolithography, the photocurable composition including: a (meth)acrylic monomer (X) that is at least one selected from the group consisting of di(meth)acrylic monomers containing, within one molecule, two aromatic rings and two (meth)acryloyloxy groups, and that has a weight average molecular weight of from 400 to 580; a (meth)acrylic monomer (D) that is at least one selected from the group consisting of (meth)acrylic monomers containing, within one molecule, at least one aromatic ring and one (meth)acryloyloxy group, and that has a weight average molecular weight of from 140 to 350; and a photopolymerization initiator.
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公开(公告)号：US20230295359A1
公开(公告)日：2023-09-21
申请号：US18159262
申请日：2023-01-25
发明人： Harunobu KOMATSU , Koji HORIBA
IPC分类号： C08F220/30 , C09D11/38 , C09D11/107 , C08F220/06 , C08F212/08
CPC分类号： C08F220/301 , C08F212/08 , C08F220/06 , C09D11/107 , C09D11/38 , C08F2438/03
摘要： A method of producing an acrylic copolymer of the present disclosure is a method of producing an acrylic copolymer that contains a RAFT agent, a polymerization initiator, and a monomer including at least an acrylic monomer, in which a mass ratio of an amount of the polymerization initiator to be charged to an amount of the RAFT agent to be charged is preferably 3.0 or greater and 18.0 or less. A mass ratio of an amount of the monomer to be charged to the amount of the RAFT agent to be charged is 100 or greater and 1000 or less. A mass ratio of an amount of the monomer to be charged to the amount of the polymerization initiator to be charged is 50 or greater and 300 or less.
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公开(公告)号：US11703760B2
公开(公告)日：2023-07-18
申请号：US17223256
申请日：2021-04-06
发明人： Jun Hatakeyama , Masahiro Fukushima
IPC分类号： G03F7/004 , G03F7/11 , G03F7/039 , G03F7/038 , C07C69/653 , C08F220/24 , C08F220/28 , C08F212/14 , C08F220/30 , C08F220/22
CPC分类号： G03F7/0392 , C07C69/653 , C08F212/24 , C08F220/22 , C08F220/24 , C08F220/281 , C08F220/282 , C08F220/283 , C08F220/301 , C08F220/303 , G03F7/0046 , G03F7/0382 , G03F7/0397 , G03F7/11 , C07C2601/08
摘要： A fluorocarboxylic acid-containing polymer comprising recurring units having formula (A1), but not acid labile group-containing recurring units is provided. A resist composition comprising the same offers a high sensitivity and is unsusceptible to nano-bridging or pattern collapse independent of whether it is of positive or negative tone.
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公开(公告)号：US11693316B2
公开(公告)日：2023-07-04
申请号：US17121190
申请日：2020-12-14
IPC分类号： G03F7/039 , G03F7/004 , G03F7/038 , C08F220/18 , C08F212/14 , C08F220/30 , C08F212/32 , C08F220/28
CPC分类号： G03F7/0392 , C08F212/24 , C08F212/32 , C08F220/1805 , C08F220/1806 , C08F220/1807 , C08F220/1808 , C08F220/1811 , C08F220/1818 , C08F220/281 , C08F220/301 , G03F7/0045 , G03F7/0382
摘要： A resist composition including a resin component having a constitutional unit derived from a compound represented by General Formula (a01-1) and a constitutional unit derived from a compound represented by General Formula (a02-1), and an acid generator component composed of an anion moiety and a cation moiety. In General Formula (a01-1), W1 represents a polymerizable group-containing group, Ct represents a tertiary carbon atom, R11 represents an unsaturated hydrocarbon group which may have a substituent, R12 and R13 represent a chain saturated hydrocarbon group which may have a substituent, and a carbon atom at an α-position of Ct constitutes a carbon-carbon unsaturated bond. In General Formula (a02-1), W2 represents a polymerizable group-containing group, Wa2 represents an aromatic hydrocarbon group, and n2 represents an integer in a range of 1 to 3
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公开(公告)号：US20240329523A1
公开(公告)日：2024-10-03
申请号：US18618304
申请日：2024-03-27
申请人： JSR CORPORATION
发明人： Ken MARUYAMA
IPC分类号： G03F7/004 , C08F212/14 , C08F220/30 , G03F7/038 , G03F7/039
CPC分类号： G03F7/0045 , C08F212/24 , C08F220/301 , G03F7/038 , G03F7/039
摘要： A radiation-sensitive composition includes: a polymer comprising a first structural unit represented by formula (1); and a compound comprising an anion and a radiation-sensitive onium cation. At least one of the polymer and the compound has a ring structure having at least one iodine atom bonded to the ring structure. R1 represents a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group; L1 represents a single bond, —COO—, or —CONH—; Ar1 represents a group obtained by removing two hydrogen atoms from a substituted or unsubstituted aromatic hydrocarbon ring; and R2 represents an acid-labile group.
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公开(公告)号：US12049528B2
公开(公告)日：2024-07-30
申请号：US17728900
申请日：2022-04-25
IPC分类号： C08F2/46 , C08F2/50 , C08F220/12 , C08F220/30 , C08G61/04 , A61C7/00 , B33Y70/00 , B33Y80/00
CPC分类号： C08F220/12 , C08F2/50 , C08F220/301 , C08F220/302 , A61C7/00 , B33Y70/00 , B33Y80/00
摘要： Provided herein are curable compositions for use in a high temperature lithography-based photopolymerization process, and telechelic block polymers and methods of using such polymers in curable compositions to produce medical devices such as orthodontic appliances comprising the polymeric compositions comprising the telechelic block polymers.
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