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公开(公告)号:US07186313B2
公开(公告)日:2007-03-06
申请号:US10765445
申请日:2004-01-28
申请人: Andrej S Mitrovic , Maolin Long , Paul Moroz , Steven T Fink , William D Jones
发明人: Andrej S Mitrovic , Maolin Long , Paul Moroz , Steven T Fink , William D Jones
IPC分类号: H01L21/306
CPC分类号: H01L21/67248 , G05D23/1934 , H01J37/32522 , H01L21/67069 , H01L21/67109
摘要: A device and method for controlling the temperature of a plasma chamber inside wall or other surfaces exposed to the plasma by a plurality of temperature control systems. A plasma process within the plasma chamber can be controlled by independently controlling the temperature of segments of the wall or other surfaces.